Inventor
YUNG-LIN HSU
Inventor
TW
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices32%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1032%
C23CCoating metallic material14%
H01JElectric discharge tubes or discharge lamps14%
H10DInorganic electric semiconductor devices5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
PatentTitleYear
12,272,580Modular pressurized workstation202512,051,593Method for an ion implantation process employing an ion-collecting device that collects a distribution of ejected ions from a target to correct a tilt angle of the target202411,901,206Modular pressurized workstation202411,626,315Semiconductor structure and planarization method thereof202311,615,961Method for ion implantation that adjusts a targets tilt angle based on a distribution of ejected ions from a target202311,587,811Modular pressurized workstation202311,195,720Method for ion implantation that adjusts a target's tilt angle based on a distribution of ejected ions from a target2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (7)· patent assignee history
2021–2025Based in TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 7 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 7 | 2021–2025 |