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Inventor

Peter D. Roper

Inventor
Clinton Corners, NY, US

Overview

3→
Patents
2000–2003
Patent span
Performing operations
Primary field (CPC B)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
B24BMachines, devices, or processes for grinding or polishing22%
B24CAbrasive or related blasting with particulate material11%
C09GPolishing compositions11%
C09KMaterials for miscellaneous applications, not provided for elsewhere11%
C23FNon-mechanical removal of metallic material from surface11%
PatentTitleYear
6,632,377'Chemical-mechanical planarization of metallurgy'20036,251,787'Elimination of photo-induced electrochemical dissolution in chemical mechanical polishing'20016,153,043'Elimination of photo-induced electrochemical dissolution in chemical mechanical polishing'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2003Patents assigned to IBM (3)· patent assignee history
2000–2003Based in Clinton Corners, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IBM32000–2003
Locations
LocationPatentsSpan
Clinton Corners, New York, US32000–2003