Inventor
Tadashi Nagayama
Inventor
Tokyo, JP
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices75%
Y10TTechnical subjects covered by former us classification20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
PatentTitleYear
10,209,623Exposure apparatus, exposure method, and method for producing device20199,927,713'Surface position detection apparatus, exposure apparatus, and exposure method'20189,519,223'Surface position detection apparatus, exposure apparatus, and exposure method'20169,383,656'Exposure apparatus, exposure method, and method for producing device'20169,069,261'Surface position detection apparatus, exposure apparatus, and exposure method'20159,063,438'Exposure apparatus, exposure method, and method for producing device'20158,384,875'Exposure apparatus, exposure method, and method for producing device'20138,149,382'Surface position detection apparatus, exposure apparatus, and exposure method'20128,130,361'Exposure apparatus, exposure method, and method for producing device'20125,872,618'Projection exposure apparatus'19995,797,674'Illumination optical system, alignment apparatus, and projection exposure apparatus using the same'19985,798,838'Projection exposure apparatus having function of detecting intensity distribution of spatial image, and method of detecting the same'19985,754,299'Inspection apparatus and method for optical system, exposure apparatus provided with the inspection apparatus, and alignment apparatus and optical system thereof applicable to the exposure apparatus'19985,680,200'Inspection apparatus and method for optical system, exposure apparatus provided with the inspection apparatus, and alignment apparatus and optical system thereof applicable to the exposure apparatus'19975,552,892'Illumination optical system, alignment apparatus, and projection exposure apparatus using the same'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2019Patents assigned to NIKON CORP (15)· patent assignee history
1996–1997Based in Ota, JP· patent location history
1998–2018Based in Tokyo, JP· patent location history
2012–2015Patents assigned to NAGAYAMA TADASHI (5)· patent assignee history
2012–2015Patents assigned to HIDAKA YASUHIRO (3)· patent assignee history
2012–2015Patents assigned to KANAYA YUHO (2)· patent assignee history
2012–2015Patents assigned to MASADA TAKAHIRO (2)· patent assignee history
2012–2019Based in Toshima-ku, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIKON CORP | 15 | 1996–2019 |
| NAGAYAMA TADASHIself | 5 | 2012–2015 |
| HIDAKA YASUHIRO | 3 | 2012–2015 |
| KANAYA YUHO | 2 | 2012–2015 |
| MASADA TAKAHIRO | 2 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 9 | 1998–2018 |
| Toshima-ku, JP | 4 | 2012–2019 |
| Ota, JP | 2 | 1996–1997 |