Inventor

Ichiro Mori

Inventor

Yokohama, JP

Overview

30→

Patents

1982–2021

Patent span

Physics

Primary field (CPC G)

Patents· 30 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%

H01JElectric discharge tubes or discharge lamps9%

A61PSpecific therapeutic activity of chemical compounds or medicinal preparations6%

B82YSpecific uses or applications of nanostructures6%

G02BOptical elements, systems or apparatus6%

G03BApparatus or arrangements for taking photographs or for projecting or viewing them6%

A61KPreparations for medical, dental or toiletry purposes4%

H04NPictorial communication, e.g. television4%

A01NPreservation of bodies of humans or animals or plants or parts thereof3%

PatentTitleYear

11,020,290Material for absorbent article, method for manufacturing same, and absorbent article using same2021 10,818,206Display apparatus and construction method2020 10,759,749Therapeutic agent for diabetes2020 10,185,209Image projection apparatus and illumination optical system2019 9,880,452'Image projection apparatus and illumination optical system'2018 9,470,884'Image projection apparatus and illumination optical system'2016 9,200,269'Î²-glucuronidase inhibitor'2015 8,786,692'Image processing device and electronic apparatus'2014 7,482,455'Chemical compounds'2009 7,181,707'Method of setting process parameter and method of setting process parameter and/or design rule'2007 7,120,882'Method of setting process parameter and method of setting process parameter and/or design rule'2006 7,100,146'Design system of alignment marks for semiconductor manufacture'2006 6,991,878'Photomask repair method and apparatus'2006 6,761,900'Topical patch preparation containing a delayed-type hypersensitivity inducer and methods for using the same'2004 6,376,139'Control method for exposure apparatus and control method for semiconductor manufacturing apparatus'2002 6,340,542'Method of manufacturing a semiconductor device, method of manufacturing a photomask, and a master mask'2002 6,338,035'Voice input word processor'2002 6,226,074'Exposure monitor mask, exposure adjusting method and method of manufacturing semiconductor devices'2001 5,639,699'Focused ion beam deposition using TMCTS'1997 5,541,310'Herbicide resistant plants'1996 5,523,576'Charged beam drawing apparatus'1996 5,429,730'Method of repairing defect of structure'1995 5,422,205'Micropattern forming method'1995 5,248,655'1,2,4-triazole-3-yl-alkane- or cycloalkane-phosphonic acids as active substances in weed killers'1993 4,572,956'Electron beam pattern transfer system having an autofocusing mechanism'1986 4,560,278'Fixed-slit type photoelectric microscope'1985 4,480,284'Electrostatic chuck plate'1984 4,469,949'Electron beam pattern transfer device and method for aligning mask and semiconductor wafer'1984 4,467,210'Electron-beam image transfer device'1984 4,366,383'Electron beam type pattern transfer apparatus'1982

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1982–1984Based in Kodaira, JP· patent location history

1984–2007Patents assigned to TOSHIBA KK (12)· patent assignee history

1984–1986Patents assigned to TOKYO SHIBAURA ELECTRIC CO (4)· patent assignee history

1984–2015Based in Tokyo, JP· patent location history

1995–2007Based in Yokohama, JP· patent location history

2014–2019Patents assigned to SONY CORP (4)· patent assignee history

2014–2015Patents assigned to MORI ICHIRO (2)· patent assignee history

2014–2019Based in Chiba, JP· patent location history

2015–2021Patents assigned to KAO CORP (2)· patent assignee history

2021Based in Saitama, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TOSHIBA KK	12	1984–2007
SONY CORP	4	2014–2019
TOKYO SHIBAURA ELECTRIC CO	4	1984–1986
KAO CORP	2	2015–2021
MORI ICHIROself	2	2014–2015

Locations

Location	Patents	Span
Yokohama, JP	11	1995–2007
Tokyo, JP	6	1984–2015
Chiba, JP	4	2014–2019
Kodaira, JP	2	1982–1984
Saitama, JP	1	2021