Inventor
Sun-Yong Choi
Inventor
Yongin-si, KR
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1037%
G01NInvestigating or analysing materials by determining their chemical or physical properties24%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%
B01DSeparation3%
B82BNanostructures formed by manipulation of individual atoms, molecules, or limited collections of atoms or molecules as discrete units3%
C01BNon-metallic elements3%
F04BPositive-displacement machines for liquids3%
G01BMeasuring length, thickness or similar linear dimensions3%
G01RMeasuring electric variables3%
H01BCables3%
PatentTitleYear
9,714,171'Graphene-nano particle composite having nano particles crystallized therein at a high density'20179,711,256'Graphene-nano particle composite having nanoparticles crystallized therein at a high density'20177,573,568'Method and apparatus for detecting a photolithography processing error, and method and apparatus for monitoring a photolithography process'20097,459,810'Stator of linear motor'20087,405,817'Method and apparatus for classifying defects of an object'20087,355,729'Apparatus and method for measuring a thickness of a substrate'20087,310,140'Method and apparatus for inspecting a wafer surface'20077,289,661'Apparatus and method for inspecting a substrate'20077,280,233'Method and apparatus for inspecting an edge exposure area of a wafer'20077,274,471'Systems and methods for measuring distance of semiconductor patterns'20077,271,890'Method and apparatus for inspecting defects'20077,186,577'Method for monitoring a density profile of impurities'20077,113,274'Method and apparatus for inspecting a substrate'20067,046,760'Method of measuring and controlling concentration of dopants of a thin film'20066,927,077'Method and apparatus for measuring contamination of a semiconductor substrate'20056,869,215'Method and apparatus for detecting contaminants in ion-implanted wafer'20056,815,236'Method of measuring a concentration of a material and method of measuring a concentration of a dopant of a semiconductor device'20046,800,863'Method for monitoring an ion implanter and ion implanter having a shadow jig for performing the same'20045,755,469'Wafer transfer blade'19985,676,824'Water purifier with means for indicating when filter replacement is due and for automatically initiating a membrane washing step'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997–2009Patents assigned to SAMSUNG ELECTRONICS CO LTD (16)· patent assignee history
1997–2008Based in Seoul, KR· patent location history
2004–2007Based in Sungnam, KR· patent location history
2004–2007Based in Seongnam-si, KR· patent location history
2005Patents assigned to SAMSUNG ELECTRIC (1)· patent assignee history
2007–2009Based in Yongin-si, KR· patent location history
2008Patents assigned to LG ELECTRONICS INC (1)· patent assignee history
2017Patents assigned to CHEORWON PLASMA RES INST (2)· patent assignee history
2017Based in Namyangju-si, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 16 | 1997–2009 |
| CHEORWON PLASMA RES INST | 2 | 2017 |
| LG ELECTRONICS INC | 1 | 2008 |
| SAMSUNG ELECTRIC | 1 | 2005 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yongin-si, KR | 4 | 2007–2009 |
| Sungnam, KR | 4 | 2004–2007 |
| Seongnam-si, KR | 3 | 2004–2007 |
| Namyangju-si, KR | 2 | 2017 |
| Seoul, KR | 2 | 1997–2008 |