Inventor
Kai-Lin Chuang
Inventor
Tainan, TW
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices46%
H01LSemiconductor devices15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
B05BSpraying apparatus8%
B08BCleaning in general8%
G06FElectric digital data processing8%
PatentTitleYear
10,504,758Nozzle having real time inspection functions201910,269,557Apparatus of processing semiconductor substrate20199,316,901'Method for forming patterns'20169,304,389'Photomask and fabrication method thereof'20169,274,416'Method for forming photo-mask and OPC method'20168,954,919'Calculation method for generating layout pattern in photomask'20158,748,066'Method for forming photomasks'20148,729,716'Alignment accuracy mark'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2016Patents assigned to UNITED MICROELECTRONICS CORP (6)· patent assignee history
2014Patents assigned to CHUANG KAI-LIN (1)· patent assignee history
2014Patents assigned to HUANG WEN-LIANG (1)· patent assignee history
2014Patents assigned to LIN CHIA-HUNG (1)· patent assignee history
2014–2016Based in Tainan, TW· patent location history
2019Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (2)· patent assignee history
2019Based in Chiayi, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| UNITED MICROELECTRONICS CORP | 6 | 2014–2016 |
| TAIWAN SEMICONDUCTOR MFG CO LTD | 2 | 2019 |
| CHUANG KAI-LINself | 1 | 2014 |
| HUANG WEN-LIANG | 1 | 2014 |
| LIN CHIA-HUNG | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tainan, TW | 6 | 2014–2016 |
| Chiayi, TW | 2 | 2019 |