Inventor

Jeffrey I. Hirsh

Inventor
Rochester, NY, US

Overview

13→
Patents
1997–2003
Patent span
Physics
Primary field (CPC G)

Patents· 13 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Bprimary
G02BOptical elements, systems or apparatus28%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
B41JTypewriters16%
C25DProcesses for the electrolytic or electrophoretic production of coatings12%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation8%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds4%
F04BPositive-displacement machines for liquids4%
F15CFluid-circuit elements predominantly used for computing or control purposes4%
F16KValves4%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997–2003Patents assigned to EASTMAN KODAK CO (13)· patent assignee history
1997–2003Based in Rochester, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EASTMAN KODAK CO131997–2003
Locations
LocationPatentsSpan
Rochester, New York, US131997–2003