Inventor
Mikio Yamachika
Inventor
Kuwana, JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices41%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests35%
G03CPhotosensitive materials for photographic purposes12%
C07DHeterocyclic compounds6%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds6%
PatentTitleYear
6,506,537'Radiation-sensitive resin composition'2003RE037179'Radiation sensitive resin composition'20015,731,125'Chemically amplified, radiation-sensitive resin composition'19985,679,495'Radiation sensitive resin composition'19975,556,734'Radiation sensitive resin composition comprising copolymer of isopropenylphenol and T-butyl(meth)acrylate'19965,482,816'Radiation-sensitive composition'19965,332,650'Radiation-sensitive composition'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–1998Patents assigned to JAPAN SYNTHETIC RUBBER CO LTD (5)· patent assignee history
1994–1996Based in Yokkaichi, JP· patent location history
1996–1998Based in Kuwana, JP· patent location history
2001–2003Patents assigned to JSR CORP (2)· patent assignee history
2001Based in Austin, TX, US· patent location history
2003Based in Santa Clara, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| JAPAN SYNTHETIC RUBBER CO LTD | 5 | 1994–1998 |
| JSR CORP | 2 | 2001–2003 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kuwana, JP | 3 | 1996–1998 |
| Yokkaichi, JP | 2 | 1994–1996 |
| Santa Clara, California, US | 1 | 2003 |
| Austin, Texas, US | 1 | 2001 |