LexDanaLexDanabeta
Inventor

Kazuhito Uchikura

Inventor
Yokkaichi, JP

Overview

4→
Patents
2003–2013
Patent span
Chemistry
Primary field (CPC C)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C09Gprimary
C09GPolishing compositions31%
C09KMaterials for miscellaneous applications, not provided for elsewhere31%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1031%
C23FNon-mechanical removal of metallic material from surface8%
PatentTitleYear
8,506,359'Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing method'20138,470,195'Chemical mechanical polishing aqueous dispersion preparation set, method of preparing chemical mechanical polishing aqueous dispersion, chemical mechanical polishing aqueous dispersion, and chemical mechanical polishing method'20136,935,928'Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method'20056,579,153'Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing process'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2013Patents assigned to JSR CORP (3)· patent assignee history
2003–2005Patents assigned to TOSHIBA KK (2)· patent assignee history
2003Based in Tokyo, JP· patent location history
2005Based in Chuo-ku, JP· patent location history
2013Patents assigned to SHIDA HIROTAKA (2)· patent assignee history
2013Patents assigned to UCHIKURA KAZUHITO (2)· patent assignee history
2013Patents assigned to IKEDA MASATOSHI (1)· patent assignee history
2013Based in Yokkaichi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
JSR CORP32003–2013
SHIDA HIROTAKA22013
TOSHIBA KK22003–2005
UCHIKURA KAZUHITOself22013
IKEDA MASATOSHI12013
Locations
LocationPatentsSpan
Yokkaichi, JP22013
Chuo-ku, JP12005
Tokyo, JP12003