Inventor
Cheol Hwan Park
Inventor
Seoul, KR
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices31%
H10BElectronic memory devices26%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
H01LSemiconductor devices6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
B60WConjoint control of vehicle sub-units of different type or different function2%
C01BNon-metallic elements2%
C01GCompounds containing metals not covered by subclasses c01d or c01f2%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds2%
C23CCoating metallic material2%
PatentTitleYear
11,039,458Methods and apparatuses for transmission scheduling on multiple frequencies202111,024,438Chalcogen-containing compound, its preparation method and thermoelectric element comprising the same20219,362,421'Semiconductor device including a support structure'20169,142,634'Versatile spin-polarized electron source'20158,476,688'Semiconductor device and method for manufacturing the same,which prevents leaning of a storage node when forming a capacitor having a plurality of storage nodes of “L†or “+†shape support patterns'20138,470,668'Method for forming pillar type capacitor of semiconductor device'20138,148,764'Semiconductor device having a high aspect cylindrical capacitor and method for fabricating the same'20127,985,645'Semiconductor device having a high aspect cylindrical capacitor and method for fabricating the same'20117,906,419'Laser annealing method for manufacturing semiconductor device'20117,723,183'Capacitor having tapered cylindrical storage node and method for manufacturing the same'20107,713,831'Method for fabricating capacitor in semiconductor device'20107,638,407'Method for forming capacitor of semiconductor device'20097,576,383'Capacitor having tapered cylindrical storage node and method for manufacturing the same'20097,153,739'Method for manufacturing a capacitor of a semiconductor device'20067,084,072'Method of manufacturing semiconductor device'20066,964,930'Method of fabricating dielectric layer'20056,962,856'Method for forming device isolation film of semiconductor device'20056,955,974'Method for forming isolation layer of semiconductor device'20056,913,963'Method for fabricating capacitor in semiconductor device'20056,884,678'Method for forming capacitor of semiconductor device'20056,825,518'Capacitor in semiconductor device and method for fabricating the same'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2013Patents assigned to HYNIX SEMICONDUCTOR INC (16)· patent assignee history
2004–2015Based in Seoul, KR· patent location history
2009–2013Based in Gyeonggi-do, KR· patent location history
2010–2016Based in Icheon-si, KR· patent location history
2012–2013Patents assigned to CHO HO JIN (3)· patent assignee history
2012–2013Patents assigned to PARK CHEOL HWAN (3)· patent assignee history
2012–2013Patents assigned to LEE DONG KYUN (2)· patent assignee history
2013–2016Patents assigned to SK HYNIX INC (2)· patent assignee history
2021Based in San Diego, CA, US· patent location history
2021Based in Daejeon, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HYNIX SEMICONDUCTOR INC | 16 | 2004–2013 |
| CHO HO JIN | 3 | 2012–2013 |
| PARK CHEOL HWANself | 3 | 2012–2013 |
| LEE DONG KYUN | 2 | 2012–2013 |
| SK HYNIX INC | 2 | 2013–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Seoul, KR | 11 | 2004–2015 |
| Gyeonggi-do, KR | 5 | 2009–2013 |
| Icheon-si, KR | 3 | 2010–2016 |
| San Diego, California, US | 1 | 2021 |
| Daejeon, KR | 1 | 2021 |