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Inventor

Shunji Katai

Inventor
Tokyo, JP

Overview

1→
Patents
2004
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests50%
PatentTitleYear
6,803,170'Resist composition and method for manufacturing semiconductor device using the resist composition'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004Patents assigned to IDEMITSU PETROCHEMICAL CO (1)· patent assignee history
2004Patents assigned to SEMICONDUCTOR LEADING EDGE TEC (1)· patent assignee history
2004Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IDEMITSU PETROCHEMICAL CO12004
SEMICONDUCTOR LEADING EDGE TEC12004
Locations
LocationPatentsSpan
Tokyo, JP12004