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Inventor

Qiushi ZHU

Inventor
US

Overview

3→
Patents
2022–2025
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Bprimary
G02BOptical elements, systems or apparatus30%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
H05GX-ray technique30%
G21KHandling of particles or ionising radiation not otherwise provided for10%
PatentTitleYear
12,287,455Oxygen-loss resistant top coating for optical elements202511,846,887Prolonging optical element lifetime in an EUV lithography system202311,340,532Prolonging optical element lifetime in an EUV lithography system2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2025Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2022–2023Based in US· patent location history
2025Based in CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32022–2025
Locations
LocationPatentsSpan
US22022–2023
CN12025