Inventor
Masaki Nagai
Inventor
Tokyo, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
C07CAcyclic or carbocyclic compounds10%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds10%
H01LSemiconductor devices10%
PatentTitleYear
10,042,247Mask blank, method for manufacturing mask blank and transfer mask20189,746,764'Mask blank and transfer mask'20178,603,731'Resist underlayer film forming composition for electron beam lithography'20137,833,681'Mask blank and mask'20107,736,822'Resist underlayer coating forming composition for mask blank, mask blank and mask'20106,855,845'Process for the preparing bromoisophithalic acid compound'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2018Patents assigned to NISSAN CHEMICAL IND LTD (5)· patent assignee history
2005–2010Based in Chiyoda-ku, JP· patent location history
2010–2018Patents assigned to HOYA CORP (4)· patent assignee history
2010Patents assigned to NISSIN CHEMICAL IND LTD (1)· patent assignee history
2013Patents assigned to ENOMOTO TOMOYUKI (1)· patent assignee history
2013Patents assigned to NAGAI MASAKI (1)· patent assignee history
2013–2018Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NISSAN CHEMICAL IND LTD | 5 | 2005–2018 |
| HOYA CORP | 4 | 2010–2018 |
| ENOMOTO TOMOYUKI | 1 | 2013 |
| NAGAI MASAKIself | 1 | 2013 |
| NISSIN CHEMICAL IND LTD | 1 | 2010 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 3 | 2013–2018 |
| Chiyoda-ku, JP | 3 | 2005–2010 |