Inventor

Junko Katayama

Inventor

Kyoto, JP

Overview

2005–2021

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%

A61KPreparations for medical, dental or toiletry purposes8%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry8%

B01LChemical or physical laboratory apparatus for general use8%

C07CAcyclic or carbocyclic compounds8%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds8%

C09DCoating compositions, e.g. paints, varnishes or lacquers8%

C12MApparatus for enzymology or microbiology8%

G01NInvestigating or analysing materials by determining their chemical or physical properties8%

Y02PClimate change mitigation technologies in the production or processing of goods8%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2005Patents assigned to KRI INC (1)· patent assignee history

2005–2009Based in Kyoto, JP· patent location history

2009Patents assigned to OSAKA GAS CO LTD (1)· patent assignee history

2021Patents assigned to NISSAN CHEMICAL IND LTD (1)· patent assignee history

2021Based in Tokyo, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations

Location	Patents	Span
Kyoto, JP	2	2005–2009
Tokyo, JP	1	2021