Inventor
Wei Liu
Inventor
Santa Clara, CA, US
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%
G01BMeasuring length, thickness or similar linear dimensions23%
G01NInvestigating or analysing materials by determining their chemical or physical properties13%
G06FElectric digital data processing13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
G05BControl or regulating systems in general5%
G02BOptical elements, systems or apparatus3%
G06KGraphical data reading3%
G06NComputing arrangements based on specific computational models3%
G06TImage data processing or generation, in general3%
PatentTitleYear
11,029,868Initialization code/data memory mapping system202111,023,217Systems and methods for support of selective processor microcode updates202111,016,835System and method for improved handling of memory failures202110,423,745Correction for flare effects in lithography system20199,903,823'Metrology method and apparatus'20188,887,104'Correction for flare effects in lithography system'20147,949,490'Determining profile parameters of a structure using approximation and fine diffraction models in optical metrology'20117,783,669'Data flow management in generating profile models used in optical metrology'20107,765,234'Data flow management in generating different signal formats used in optical metrology'20107,729,873'Determining profile parameters of a structure using approximation and fine diffraction models in optical metrology'20107,639,375'Determining transmittance of a photomask using optical metrology'20097,627,392'Automated process control using parameters determined with approximation and fine diffraction models'20097,617,075'Library accuracy enhancment and evaluation'20097,515,283'Parallel profile determination in optical metrology'20097,469,192'Parallel profile determination for an optical metrology system'20087,421,414'Split machine learning systems'20087,302,367'Library accuracy enhancement and evaluation'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2008Patents assigned to TIMBRE TECH INC (2)· patent assignee history
2007–2011Based in Santa Clara, CA, US· patent location history
2008–2011Patents assigned to TOKYO ELECTRON LTD (9)· patent assignee history
2014–2019Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2014Patents assigned to CHEN LUOQI (1)· patent assignee history
2014–2019Based in Los Altos, CA, US· patent location history
2021Patents assigned to DELL PRODUCTS LP (3)· patent assignee history
2021Based in Austin, TX, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 9 | 2008–2011 |
| ASML NETHERLANDS BV | 3 | 2014–2019 |
| DELL PRODUCTS LP | 3 | 2021 |
| TIMBRE TECH INC | 2 | 2007–2008 |
| CHEN LUOQI | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Santa Clara, California, US | 11 | 2007–2011 |
| Austin, Texas, US | 3 | 2021 |
| Los Altos, California, US | 3 | 2014–2019 |