Inventor
Rogier Hendrikus Magdalena Cortie
Inventor
Ittervoort, NL
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices37%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them12%
G09GArrangements or circuits for control of indicating devices using static means to present variable information5%
H01LSemiconductor devices5%
Y10TTechnical subjects covered by former us classification3%
B67DDispensing, delivering or transferring liquids, not otherwise provided for2%
G02BOptical elements, systems or apparatus2%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein2%
G06FElectric digital data processing2%
PatentTitleYear
11,029,607Fluid handling structure for lithographic apparatus202110,620,544Fluid handling structure, lithographic apparatus and device manufacturing method202010,481,502Object holder and lithographic apparatus201910,209,624Fluid handling structure, lithographic apparatus and device manufacturing method201910,133,190Fluid handling structure, a lithographic apparatus and a device manufacturing method201810,018,926Lithographic apparatus and method of manufacturing a lithographic apparatus20189,971,255Fluid handling structure, a lithographic apparatus and a device manufacturing method20189,939,738Lithographic apparatus and an object positioning system20189,915,877'Object holder and lithographic apparatus'20189,846,372Fluid handling structure, lithographic apparatus and device manufacturing method20179,785,055'Object holder and lithographic apparatus'20179,625,828'Fluid handling structure, lithographic apparatus and device manufacturing method'20179,588,437'Fluid handling structure, a lithographic apparatus and a device manufacturing method'20179,563,132'Fluid handling structure, a lithographic apparatus and a device manufacturing method'20179,442,390'Fluid handling structure including gas supply and gas recovery openings, a lithographic apparatus and a device manufacturing method'20169,291,914'Fluid handling structure, a lithographic apparatus and a device manufacturing method'20169,256,136'Fluid handling structure, lithographic apparatus and device manufacturing method involving gas supply'20169,235,138'Fluid handling structure, a lithographic apparatus and a device manufacturing method'20169,069,262'Fluid handling structure including gas supply and gas recovery openings, lithographic apparatus and device manufacturing method'20158,953,141'Immersion lithographic apparatus and device manufacturing method with asymmetric acceleration profile of substrate table to maintain meniscus of immersion liquid'20158,902,400'Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus'20148,836,912'Fluid handling structure, a lithographic apparatus and a device manufacturing method'20148,780,324'Fluid handling structure, lithographic apparatus and device manufacturing method'20148,614,784'Fluid handling structure, lithographic apparatus and device manufacturing method, involving gas supply'20137,956,820'Combined single/multiple view-display'20117,804,483'Electrophoretic display with rapid drawing mode waveform'20107,796,115'Scrolling function in an electrophoretic display device'20107,623,113'Method of compensating temperature dependence of driving schemes for electrophoretic displays'2009Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2009–2020Based in Ittervoort, NL· patent location history
2010Based in Eindhoven, NL· patent location history
2013–2021Patents assigned to ASML NETHERLANDS BV (24)· patent assignee history
2013–2017Patents assigned to CORTIE ROGIER HENDRIKUS MAGDALENA (10)· patent assignee history
2013–2017Patents assigned to RIEPEN MICHEL (8)· patent assignee history
2013–2017Patents assigned to EVANGELISTA FABRIZIO (4)· patent assignee history
2014–2017Patents assigned to ROPS CORNELIUS MARIA (5)· patent assignee history
2021Based in Weert, NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 24 | 2013–2021 |
| CORTIE ROGIER HENDRIKUS MAGDALENAself | 10 | 2013–2017 |
| RIEPEN MICHEL | 8 | 2013–2017 |
| ROPS CORNELIUS MARIA | 5 | 2014–2017 |
| EVANGELISTA FABRIZIO | 4 | 2013–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Ittervoort, NL | 26 | 2009–2020 |
| Weert, NL | 1 | 2021 |
| Eindhoven, NL | 1 | 2010 |