Inventor

Sidlgata V. Sreenivasan

Inventor

Austin, TX, US

Overview

2004–2021

Patent span

Performing operations

Primary field (CPC B)

Patents· 135 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%

B82YSpecific uses or applications of nanostructures23%

B29CShaping or joining of plastics12%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%

B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems4%

Y10TTechnical subjects covered by former us classification3%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%

H01LSemiconductor devices2%

G03BApparatus or arrangements for taking photographs or for projecting or viewing them2%

PatentTitleYear

11,020,894Safe separation for nano imprinting2021 10,816,482High throughput, high resolution optical metrology for reflective and transmissive nanophotonic devices2020 10,717,646Precision alignment of the substrate coordinate system relative to the inkjet coordinate system2020 10,578,964Asymmetric template shape modulation for partial field imprinting2020 10,336,062Systems and methods for precision inkjet printing2019 RE047483Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template2019 10,191,368Multi-field overlay control in jet and flash imprint lithography2019 10,026,609Nanoshape patterning techniques that allow high-speed and low-cost fabrication of nanoshape structures2018 9,987,653Versatile process for precision nanoscale manufacturing2018 9,972,699Fabricating large area multi-tier nanostructures2018 9,972,698Fabricating large area multi-tier nanostructures2018 9,941,389Fabricating large area multi-tier nanostructures2018 9,778,562'Porous template and imprinting stack for nano-imprint lithography'2017 9,718,096'Programmable deposition of thin films of a user-defined profile with nanometer scale accuracy'2017 9,616,614'Large area imprint lithography'2017 9,415,418'Programmable deposition of thin films of a user-defined profile with nanometer scale accuracy'2016 9,223,202'Method of automatic fluid dispensing for imprint lithography processes'2015 9,196,765'Nanostructured solar cell'2015 9,070,803'Nanostructured solar cell'2015 8,980,751'Methods and systems of material removal and pattern transfer'2015 8,968,620'Safe separation for nano imprinting'2015 8,961,800'Functional nanoparticles'2015 8,916,200'Nanoimprint lithography formation of functional nanoparticles using dual release layers'2014 8,877,073'Imprint lithography template'2014 8,865,046'Imprinting of partial fields at the edge of the wafer'2014 8,850,980'Tessellated patterns in imprint lithography'2014 8,828,297'Patterning of non-convex shaped nanostructures'2014 8,808,808'Method for imprint lithography utilizing an adhesion primer layer'2014 8,802,747'Nanoimprint lithography processes for forming nanoparticles'2014 8,609,326'Methods for exposure for the purpose of thermal management for imprint lithography processes'2013 8,556,616'Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template'2013 8,545,709'Critical dimension control during template formation'2013 8,529,778'Large area patterning of nano-sized shapes'2013 8,394,282'Adaptive nanotopography sculpting'2013 8,387,482'Method and system to control movement of a body for nano-scale manufacturing'2013 8,349,241'Method to arrange features on a substrate to replicate features having minimal dimensional variability'2013 8,334,967'Substrate support system having a plurality of contact lands'2012 8,318,066'Step and repeat imprint lithography process'2012 8,282,383'Method for expelling gas positioned between a substrate and a mold'2012 8,187,515'Large area roll-to-roll imprint lithography'2012 8,142,850'Patterning a plurality of fields on a substrate to compensate for differing evaporation times'2012 8,123,514'Conforming template for patterning liquids disposed on substrates'2012 8,109,754'Method and system for double-sided patterning of substrates'2012 8,109,753'Double-sided nano-imprint lithography system'2012 8,075,299'Reduction of stress during template separation'2011 8,066,930'Forming a layer on a substrate'2011 8,057,725'Capillary imprinting technique'2011 8,033,814'Device for holding a template for use in imprint lithography'2011 8,021,594'Preserving filled features when vacuum wiping'2011 8,016,277'Flexure based macro motion translation stage'2011 8,012,394'Template pattern density doubling'2011 7,947,608'Positive tone bi-layer method'2011 7,943,081'Step and repeat imprint lithography processes'2011 7,935,292'Imprinting of partial fields at the edge of the wafer'2011 7,927,541'Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography'2011 7,910,042'Capillary imprinting technique'2011 7,858,528'Positive tone bi-layer method'2010 7,815,824'Real time imprint process diagnostics for defects'2010 7,802,978'Imprinting of partial fields at the edge of the wafer'2010 7,795,132'Self-aligned cross-point memory fabrication'2010 7,780,893'Method of concurrently patterning a substrate having a plurality of fields and a plurality of alignment marks'2010 7,768,624'Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques'2010 7,727,453'Step and repeat imprint lithography processes'2010 7,708,926'Capillary imprinting technique'2010 7,708,542'Device for holding a template for use in imprint lithography'2010 7,699,598'Conforming template for patterning liquids disposed on substrates'2010 7,691,313'Method for expelling gas positioned between a substrate and a mold'2010 7,670,529'Method and system for double-sided patterning of substrates'2010 7,670,530'Patterning substrates employing multiple chucks'2010 7,670,953'Positive tone bi-layer method'2010 7,635,445'Method of separating a mold from a solidified layer disposed on a substrate'2009 7,547,504'Pattern reversal employing thick residual layers'2009 7,535,549'System and method for improvement of alignment and overlay for microlithography'2009 7,491,637'Formation of conductive templates employing indium tin oxide'2009 7,442,336'Capillary imprinting technique'2008 7,432,634'Remote center compliant flexure device'2008 7,420,654'Method of varying dimensions of a substrate during nano-scale manufacturing'2008 7,396,475'Method of forming stepped structures employing imprint lithography'2008 7,374,415'Apparatus to control displacement of a body spaced-apart from a surface'2008 7,357,876'Eliminating printability of sub-resolution defects in imprint lithography'2008 7,323,417'Method of forming a recessed structure employing a reverse tone process'2008 7,323,130'Magnification correction employing out-of-plane distortion of a substrate'2008 7,307,697'Adaptive shape substrate support system'2007 7,303,383'Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks'2007 7,298,456'System for varying dimensions of a substrate during nanoscale manufacturing'2007 7,279,113'Method of forming a compliant template for UV imprinting'2007 7,261,830'Applying imprinting material to substrates employing electromagnetic fields'2007 7,261,831'Positive tone bi-layer imprint lithography method'2007 7,259,833'Substrate support method'2007 7,252,715'System for dispensing liquids'2007 7,252,777'Method of forming an in-situ recessed structure'2007 7,245,358'Substrate support system'2007 7,244,386'Method of compensating for a volumetric shrinkage of a material disposed upon a substrate to form a substantially planar structure therefrom'2007 7,241,395'Reverse tone patterning on surfaces having planarity perturbations'2007 7,229,273'Imprint lithography template having a feature size under 250 nm'2007 7,224,443'Imprint lithography substrate processing tool for modulating shapes of substrates'2007 7,205,244'Patterning substrates employing multi-film layers defining etch-differential interfaces'2007 7,186,656'Method of forming a recessed structure employing a reverse tone process'2007 7,186,483'Method of determining alignment of a template and a substrate having a liquid disposed therebetween'2007 7,179,079'Conforming template for patterning liquids disposed on substrates'2007 7,179,396'Positive tone bi-layer imprint lithography method'2007 7,170,589'Apparatus to vary dimensions of a substrate during nano-scale manufacturing'2007 7,150,622'Systems for magnification and distortion correction for imprint lithography processes'2006 7,140,861'Compliant hard template for UV imprinting'2006 7,136,150'Imprint lithography template having opaque alignment marks'2006 7,105,452'Method of planarizing a semiconductor substrate with an etching chemistry'2006 7,098,572'Apparatus to control displacement of a body spaced-apart from a surface'2006 7,077,992'Step and repeat imprint lithography processes'2006 7,071,088'Method for fabricating bulbous-shaped vias'2006 7,070,405'Alignment systems for imprint lithography'2006 7,060,402'Method of orientating a template with respect to a substrate in response to a force exerted on the template'2006 7,060,324'Method of creating a dispersion of a liquid on a substrate'2006 7,036,389'System for determining characteristics of substrates employing fluid geometries'2006 7,019,835'Method and system to measure characteristics of a film disposed on a substrate'2006 7,019,819'Chucking system for modulating shapes of substrates'2006 6,990,870'System for determining characteristics of substrates employing fluid geometries'2006 6,986,975'Method of aligning a template with a substrate employing moire patterns'2006 6,982,783'Chucking system for modulating shapes of substrates'2006 6,980,282'Method for modulating shapes of substrates'2005 6,964,793'Method for fabricating nanoscale patterns in light curable compositions using an electric field'2005 6,955,868'Method to control the relative position between a body and a surface'2005 6,926,929'System and method for dispensing liquids'2005 6,922,906'Apparatus to orientate a body with respect to a surface'2005 6,921,615'High-resolution overlay alignment methods for imprint lithography'2005 6,919,152'High resolution overlay alignment systems for imprint lithography'2005 6,916,585'Method of varying template dimensions to achieve alignment during imprint lithography'2005 6,916,584'Alignment methods for imprint lithography'2005 6,908,861'Method for imprint lithography using an electric field'2005 6,902,853'Dual wavelength method of determining a relative position of a substrate and a template'2005 6,900,881'Step and repeat imprint lithography systems'2005 6,871,558'Method for determining characteristics of substrate employing fluid geometries'2005 6,873,087'High precision orientation alignment and gap control stages for imprint lithography processes'2005 6,870,301'Method of separating a template from a substrate during imprint lithography'2005 6,842,229'Imprint lithography template comprising alignment marks'2005 6,696,220'Template for room temperature, low pressure micro-and nano-imprint lithography'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2020Patents assigned to UNIV TEXAS (47)· patent assignee history

2004–2021Based in Austin, TX, US· patent location history

2005–2021Patents assigned to MOLECULAR IMPRINTS INC (86)· patent assignee history

2011–2017Patents assigned to SREENIVASAN SIDLGATA V (33)· patent assignee history

2011–2017Patents assigned to CHOI BYUNG-JIN (15)· patent assignee history

2011–2017Patents assigned to XU FRANK Y (14)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
MOLECULAR IMPRINTS INC	86	2005–2021
UNIV TEXAS	47	2004–2020
SREENIVASAN SIDLGATA Vself	33	2011–2017
CHOI BYUNG-JIN	15	2011–2017
XU FRANK Y	14	2011–2017

Locations

Location	Patents	Span
Austin, Texas, US	135	2004–2021