Inventor
Yoshiaki Ikuta
Inventor
Tokyo, JP
Overview
Patents· 41 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
C03CChemical composition of glasses, glazes or vitreous enamels11%
B82YSpecific uses or applications of nanostructures8%
C03BManufacture, shaping, or supplementary processes7%
Y02PClimate change mitigation technologies in the production or processing of goods5%
A61KPreparations for medical, dental or toiletry purposes3%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations3%
B08BCleaning in general3%
C07KPeptides3%
PatentTitleYear
11,112,494Photodetector and portable electronic equipment202111,061,139Ranging sensor20219,739,722'Reflective mask blank for EUV lithography, and process for its inspection and process for its production'20179,268,207'Reflective mask blank for EUV lithography, method of manufacturing thereof, reflective mask for EUV lithography and method of manufacturing thereof'20169,120,842'SPARC-derived tumor rejection antigenic peptides and medicaments comprising the same'20158,993,201'Reflective layer-equipped substrate for EUV lithography, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and process for production of the reflective layer-equipped substrate'20158,921,017'Multilayer substrate, manufacturing method for multilayer substrate, and quality control method for multilayer substrate'20148,916,316'Reflecting mask blank, method for manufacturing reflective mask blank and method for quality control for reflective mask blank'20148,580,465'Multilayer mirror for EUV lithography and process for its production'20138,518,613'Optical member base material for EUV lithography, and method for producing same'20138,470,968'SPARC-derived tumor rejection antigenic peptides and medicaments comprising the same'20138,402,786'Synthetic silica glass optical component and process for its production'20138,251,197'Banknote deposit machine, processing system and method'20128,241,821'Reflective mask blank for EUV lithography, process for producing the same and mask for EUV lithography'20128,206,510'Method and apparatus for an in-situ ultraviolet cleaning tool'20128,053,557'SPARC-derived tumor rejection antigenic peptides and medicaments comprising the same'20118,052,797'Method for removing foreign matter from substrate surface'20118,017,345'Diagnostic kit for malignant melanoma'20117,960,077'Reflective-type mask blank for EUV lithography'20117,921,859'Method and apparatus for an in-situ ultraviolet cleaning tool'20117,901,843'Process for smoothing surface of glass substrate'20117,784,307'Optical member made of synthetic quartz glass, and process for its production'20107,712,333'Method for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography'20107,694,797'Printed note processing machine and system'20107,678,511'Reflective-type mask blank for EUV lithography'20107,592,063'Quartz glass substrate and process for its production'20097,549,141'Photomask, photomask manufacturing method, and photomask processing device'20097,527,695'Apparatus and method for cleaning substrate'20097,514,382'Synthetic quartz glass for optical member and its production method'20097,504,185'Method for depositing multi-layer film of mask blank for EUV lithography and method for producing mask blank for EUV lithography'20097,368,403'Synthetic quartz glass for optical member, projection exposure apparatus and projection exposure method'20087,230,695'Defect repair device and defect repair method'20077,022,633'Synthetic quartz glass and process for producing it'20066,749,053'Bill handling machine'20046,611,317'Exposure apparatus, semiconductor device, and photomask'20036,576,578'Synthetic quartz glass and method for preparing the same'20036,544,914'Synthetic quartz glass for optical member, process for producing the same, and method of using the same'20036,499,317'Synthetic quartz glass and method for production thereof'20026,475,575'Pellicle and method for manufacture thereof'20024,919,207'Method for drawing up special crude oil'19904,756,368'Method for drawing up special crude oil'1988Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1988–2016Based in Tokyo, JP· patent location history
2002–2017Patents assigned to ASAHI GLASS CO LTD (28)· patent assignee history
2002–2013Based in Yokohama, JP· patent location history
2002–2008Based in Kanagawa, JP· patent location history
2004–2012Patents assigned to GLORY KOGYO KK (3)· patent assignee history
2009–2012Based in Schenectady, NY, US· patent location history
2011–2015Patents assigned to ONCO THERAPY SCIENCE INC (3)· patent assignee history
2011–2015Based in Kumamoto, JP· patent location history
2012–2015Patents assigned to IKUTA YOSHIAKI (8)· patent assignee history
2013–2015Patents assigned to KOMAKINE MITSUHIKO (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASAHI GLASS CO LTD | 28 | 2002–2017 |
| IKUTA YOSHIAKIself | 8 | 2012–2015 |
| GLORY KOGYO KK | 3 | 2004–2012 |
| ONCO THERAPY SCIENCE INC | 3 | 2011–2015 |
| KOMAKINE MITSUHIKO | 2 | 2013–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 9 | 1988–2016 |
| Schenectady, New York, US | 7 | 2009–2012 |
| Yokohama, JP | 5 | 2002–2013 |
| Kanagawa, JP | 5 | 2002–2008 |
| Kumamoto, JP | 4 | 2011–2015 |