Inventor

Joannes Theodoor De Smit

Inventor
Eindhoven, NL

Overview

46→
Patents
2005–2020
Patent span
Physics
Primary field (CPC G)

Patents· 46 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
10,788,755Lithographic apparatus and device manufacturing method202010,678,139Lithographic apparatus and device manufacturing method202010,620,545Lithographic apparatus and device manufacturing method202010,503,084Lithographic apparatus and device manufacturing method201910,261,428Lithographic apparatus and device manufacturing method201910,222,706Lithographic apparatus and device manufacturing method201910,191,389Lithographic apparatus and device manufacturing method201910,180,629Lithographic apparatus and device manufacturing method20199,964,858Lithographic apparatus and device manufacturing method20189,740,107'Lithographic apparatus and device manufacturing method'20179,541,843'Lithographic apparatus and device manufacturing method involving a sensor detecting a radiation beam through liquid'20179,482,966'Lithographic apparatus and device manufacturing method'20169,366,972'Lithographic apparatus and device manufacturing method'20169,195,153'Lithographic apparatus and device manufacturing method'20159,152,058'Lithographic apparatus and device manufacturing method involving a member and a fluid opening'20159,110,389'Lithographic apparatus and device manufacturing method'20159,091,940'Lithographic apparatus and method involving a fluid inlet and a fluid outlet'20159,081,299'Lithographic apparatus and device manufacturing method involving removal of liquid entering a gap'20159,057,967'Lithographic apparatus and device manufacturing method'20158,797,503'Lithographic apparatus and device manufacturing method with a liquid inlet above an aperture of a liquid confinement structure'20148,558,989'Lithographic apparatus and device manufacturing method'20138,482,845'Lithographic apparatus and device manufacturing method'20138,472,002'Lithographic apparatus and device manufacturing method'20138,363,208'Lithographic apparatus and device manufacturing method'20138,344,341'Lithographic apparatus and device manufacturing method'20138,208,120'Lithographic apparatus and device manufacturing method'20128,169,593'Lithographic apparatus and device manufacturing method'20128,154,708'Lithographic apparatus and device manufacturing method'20127,982,850'Immersion lithographic apparatus and device manufacturing method with gas supply'20117,795,603'Lithographic apparatus and device manufacturing method'20107,684,008'Lithographic apparatus and device manufacturing method'20107,593,092'Lithographic apparatus and device manufacturing method'20097,593,093'Lithographic apparatus and device manufacturing method'20097,482,611'Lithographic apparatus and device manufacturing method'20097,477,403'Optical position assessment apparatus and method'20097,459,247'Lithographic apparatus and device manufacturing method'20087,388,648'Lithographic projection apparatus'20087,372,541'Lithographic apparatus and device manufacturing method'20087,317,504'Lithographic apparatus and device manufacturing method'20087,274,029'Lithographic apparatus and device manufacturing method'20077,213,963'Lithographic apparatus and device manufacturing method'20077,199,858'Lithographic apparatus and device manufacturing method'20077,193,232'Lithographic apparatus and device manufacturing method with substrate measurement not through liquid'20077,116,404'Lithographic apparatus and device manufacturing method'20067,081,943'Lithographic apparatus and device manufacturing method'20066,952,253'Lithographic apparatus and device manufacturing method'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2020Patents assigned to ASML NETHERLANDS BV (46)· patent assignee history
2005–2020Based in Eindhoven, NL· patent location history
2012–2017Patents assigned to DE SMIT JOANNES THEODOOR (16)· patent assignee history
2012–2017Patents assigned to LOF JOERI (13)· patent assignee history
2012–2017Patents assigned to LOOPSTRA ERIK ROELOF (13)· patent assignee history
2012–2017Patents assigned to SIMON KLAUS (13)· patent assignee history
2013Based in Waalre, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV462005–2020
DE SMIT JOANNES THEODOORself162012–2017
LOF JOERI132012–2017
LOOPSTRA ERIK ROELOF132012–2017
SIMON KLAUS132012–2017
Locations
LocationPatentsSpan
Eindhoven, NL452005–2020
Waalre, NL12013