Inventor

Joachim Hartjes

Inventor

Aalen, DE

Overview

24→

Patents

2013–2021

Patent span

Physics

Primary field (CPC G)

Patents· 24 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices43%

G02BOptical elements, systems or apparatus26%

G01BMeasuring length, thickness or similar linear dimensions4%

G21KHandling of particles or ionising radiation not otherwise provided for4%

B29CShaping or joining of plastics2%

F16FSprings2%

F25BRefrigeration machines, plants or systems2%

G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%

G01KMeasuring temperature2%

G01LMeasuring force, stress, torque, work, mechanical power, mechanical efficiency, or fluid pressure2%

PatentTitleYear

11,054,755Optical module with an anticollision device for module components2021 10,613,443Optical system, lithography apparatus and method2020 10,288,894Optical component for use in a radiation source module of a projection exposure system2019 10,162,267Projection exposure apparatus including mechanism to reduce influence of pressure fluctuations2018 10,162,270Projection exposure apparatus comprising a measuring system for measuring an optical element2018 10,146,138Method for producing an optical element for an optical system, in particular for a microlithographic projection exposure apparatus2018 10,012,911Projection exposure apparatus with wavefront measuring device and optical wavefront manipulator2018 9,846,375Lithography apparatus with segmented mirror2017 9,759,550'Projection exposure apparatus for microlithography comprising an optical distance measurement system'2017 9,714,822'Projection exposure apparatus for microlithography comprising an optical distance measurement system'2017 9,684,243'Blocking element for protecting optical elements in projection exposure apparatuses'2017 9,671,584'Method and cooling system for cooling an optical element for EUV applications'2017 9,599,910'Facet mirror device'2017 9,500,957'Arrangement for thermal actuation of a mirror in a microlithographic projection exposure apparatus'2016 9,482,959'EUV microlithography illumination optical system and EUV attenuator for same'2016 9,465,208'Facet mirror device'2016 9,423,590'Liquid cooled EUV reflector'2016 9,207,541'Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus'2015 9,134,501'Optical element unit and method of supporting an optical element'2015 9,063,336'Optical element having a plurality of reflective facet elements'2015 8,831,170'Mirror with a mirror carrier and projection exposure apparatus'2014 8,587,767'Illumination optics for EUV microlithography and related system and apparatus'2013 8,441,747'Optical module with minimized overrun of the optical element'2013 8,345,219'Method and apparatus for setting an illumination optical unit'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2021Patents assigned to ZEISS CARL SMT GMBH (23)· patent assignee history

2013–2016Patents assigned to HARTJES JOACHIM (7)· patent assignee history

2013–2016Patents assigned to BINGEL ULRICH (2)· patent assignee history

2013–2015Patents assigned to ENDRES MARTIN (2)· patent assignee history

2013–2015Patents assigned to FEDERAU HAGEN (2)· patent assignee history

2013–2021Based in Aalen, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ZEISS CARL SMT GMBH	23	2013–2021
HARTJES JOACHIMself	7	2013–2016
BINGEL ULRICH	2	2013–2016
ENDRES MARTIN	2	2013–2015
FEDERAU HAGEN	2	2013–2015

Locations

Location	Patents	Span
Aalen, DE	24	2013–2021