Inventor
Takumichi Sutani
Inventor
Hitachinaka, JP
Overview
Patents· 30 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G06Tprimary
G06TImage data processing or generation, in general24%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
H01JElectric discharge tubes or discharge lamps20%
G06VImage or video recognition or understanding9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
G06FElectric digital data processing5%
G01BMeasuring length, thickness or similar linear dimensions4%
G01NInvestigating or analysing materials by determining their chemical or physical properties4%
B82YSpecific uses or applications of nanostructures2%
G01RMeasuring electric variables2%
PatentTitleYear
10,732,512Image processor, method for generating pattern using self-organizing lithographic techniques and computer program2020RE045224'Method and apparatus for creating imaging recipe'2014RE045204'Method and apparatus for creating imaging recipe'20148,788,981'Method of OPC model building, information-processing apparatus, and method of determining process conditions of semiconductor device'20148,577,124'Method and apparatus of pattern inspection and semiconductor inspection system using the same'20138,507,856'Pattern measuring method and pattern measuring device'20138,338,804'Sample dimension inspecting/measuring method and sample dimension inspecting/measuring apparatus'20128,331,651'Method and apparatus for inspecting defect of pattern formed on semiconductor device'20128,244,042'Pattern matching method and computer program for executing pattern matching'20128,199,191'Electron microscope for inspecting dimension and shape of a pattern formed on a wafer'20128,173,962'Pattern displacement measuring method and pattern measuring device'20128,131,059'Defect inspection device and defect inspection method for inspecting whether a product has defects'20128,115,169'Method and apparatus of pattern inspection and semiconductor inspection system using the same'20128,045,789'Method and apparatus for inspecting defect of pattern formed on semiconductor device'20118,019,161'Method, device and computer program of length measurement'20117,991,218'Pattern matching apparatus and semiconductor inspection system using the same'20117,978,904'Pattern inspection apparatus and semiconductor inspection system'20117,925,095'Pattern matching method and computer program for executing pattern matching'20117,923,703'Sample dimension inspecting/measuring method and sample dimension inspecting/measuring apparatus'20117,889,909'Pattern matching method and pattern matching program'20117,800,060'Pattern measurement method and pattern measurement system'20107,679,055'Pattern displacement measuring method and pattern measuring device'20107,681,159'System and method for detecting defects in a semiconductor during manufacturing thereof'20107,559,047'Method and apparatus for creating imaging recipe'20097,518,110'Pattern measuring method and pattern measuring device'20097,507,961'Method and apparatus of pattern inspection and semiconductor inspection system using the same'20097,449,689'Dimension measuring SEM system, method of evaluating shape of circuit pattern and a system for carrying out the method'20087,365,322'Method and apparatus for arranging recipe of scanning electron microscope and apparatus for evaluating shape of semiconductor device pattern'20087,108,945'Photomask having a focus monitor pattern'20066,701,512'Focus monitoring method, exposure apparatus, and exposure mask'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2006Based in Yokohama, JP· patent location history
2008–2020Patents assigned to HITACHI HIGH TECH CORP (27)· patent assignee history
2008–2014Based in Hitachinaka, JP· patent location history
2012–2014Patents assigned to SUTANI TAKUMICHI (12)· patent assignee history
2012–2014Patents assigned to MATSUOKA RYOICHI (7)· patent assignee history
2012–2014Patents assigned to MOROKUMA HIDETOSHI (6)· patent assignee history
2012–2013Patents assigned to SUGIYAMA AKIYUKI (6)· patent assignee history
2020Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI HIGH TECH CORP | 27 | 2008–2020 |
| SUTANI TAKUMICHIself | 12 | 2012–2014 |
| MATSUOKA RYOICHI | 7 | 2012–2014 |
| MOROKUMA HIDETOSHI | 6 | 2012–2014 |
| SUGIYAMA AKIYUKI | 6 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hitachinaka, JP | 27 | 2008–2014 |
| Yokohama, JP | 2 | 2004–2006 |
| Tokyo, JP | 1 | 2020 |