Inventor

Kenji Shimada

Inventor

Tokyo, JP

Overview

1984–2020

Patent span

Electricity

Primary field (CPC H)

Patents· 44 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%

H01LSemiconductor devices12%

C11DDetergent compositions11%

G06TImage data processing or generation, in general11%

G06FElectric digital data processing6%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%

A61BDiagnosis3%

C09KMaterials for miscellaneous applications, not provided for elsewhere3%

C23GCleaning or de-greasing of metallic material by chemical methods other than electrolysis3%

PatentTitleYear

10,771,728Electronic device, control method, and recording medium for displaying images based on determined state2020 10,698,541Electronic device, recording medium, and control method2020 10,689,573Wet etching composition for substrate having SiN layer and Si layer and wet etching method using same2020 10,651,028Semiconductor element cleaning solution that suppresses damage to tungsten-containing materials, and method for cleaning semiconductor element using same2020 10,629,426Semiconductor element cleaning solution that suppresses damage to cobalt, and method for cleaning semiconductor element using same2020 10,538,718Cleaning solution and cleaning method for material comprising carbon-incorporated silicon oxide for use in recycling wafer2020 10,436,575Systems and method for filling apparel with gases, fluids, or fluid-like solids to enable the accurate three-dimensional capture of apparel by three-dimensional scanning and stereo photogrammetry2019 10,377,978Alkaline earth metal-containing cleaning solution for cleaning semiconductor element, and method for cleaning semiconductor element using same2019 10,160,938Semiconductor element cleaning solution that suppresses damage to tantalum-containing materials, and cleaning method using same2018 10,035,978Semiconductor element cleaning liquid and cleaning method2018 9,803,162'Liquid composition for cleaning semiconductor device, and method for cleaning semiconductor device'2017 9,777,251'Liquid composition for removing titanium nitride, semiconductor-element cleaning method using same, and semiconductor-element manufacturing method'2017 9,587,208'Cleaning liquid composition, method for cleaning semiconductor element, and method for manufacturing semiconductor element'2017 9,422,512'Cleaning liquid for semiconductor elements and cleaning method using same'2016 9,335,909'Drawing assist device, drawing assist program, and drawing assist method'2016 9,321,119'Combination welding method using combination of gas metal arc welding and submerged-arc welding and combination arc welding machine'2016 9,191,473'Mobile terminal and touch panel operating method'2015 9,082,319'Method, apparatus, and system for computer-aided tracking, navigation and motion teaching'2015 8,859,411'Method for producing transistor'2014 8,852,451'Silicon etching fluid and method for producing transistor using same'2014 8,802,608'Composition for cleaning and rust prevention and process for producing semiconductor element or display element'2014 8,593,487'Drawing support device, drawing support program, and drawing support method'2013 8,420,529'Copper wiring surface protective liquid and method for manufacturing semiconductor circuit'2013 8,420,538'Liquid for protecting copper wiring surface and method for manufacturing semiconductor circuit element'2013 8,390,620'Technique for converting non-conforming hexahedral-to-hexahedral interfaces into conforming interfaces'2013 8,259,101'Sketch-based design system, apparatus, and method for the construction and modification of three-dimensional geometry'2012 7,998,914'Cleaning solution for semiconductor device or display device, and cleaning method'2011 7,837,621'Computer-aided bone distraction'2010 7,590,512'System and method for deformation analysis using inverse pre-deformation of finite element mesh'2009 7,572,758'Cleaning liquid and cleaning method'2009 6,915,243'Surface topology and geometry reconstruction from wire-frame models'2005 6,711,432'Computer-aided orthopedic surgery'2004 6,701,174'Computer-aided bone distraction'2004 6,625,938'System and method for converting a hex-dominant mesh to an all-hexahedral mesh'2003 6,226,405'Method and apparatus for updating node position'2001 6,124,857'Meshing method and apparatus'2000 6,121,973'Quadrilateral mesh generation method and apparatus'2000 5,808,620'System and method for displaying shadows by dividing surfaces by occlusion into umbra penumbra, and illuminated regions from discontinuity edges and generating mesh'1998 5,774,124'Finite element modeling method and computer system for converting a triangular mesh surface to a quadrilateral mesh surface'1998 5,618,993'Ultrasonic detection apparatus and method for detecting acoustic emission'1997 5,278,983'Boundary representation solid modeling system'1994 4,888,707'Object collision detection method and apparatus'1989 4,830,747'Filter apparatus for removing plankton'1989 4,456,531'Filter and a manufacturing method therefor'1984

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1984–1989Based in Ueda, JP· patent location history

1989–2005Patents assigned to IBM (8)· patent assignee history

1989–1994Based in Kawasaki, JP· patent location history

1998–2020Based in Yokohama, JP· patent location history

2000–2019Based in Pittsburgh, PA, US· patent location history

2003–2015Patents assigned to UNIV CARNEGIE MELLON (8)· patent assignee history

2009–2020Patents assigned to MITSUBISHI GAS CHEMICAL CO (18)· patent assignee history

2009–2020Based in Tokyo, JP· patent location history

2012–2016Patents assigned to SHIMADA KENJI (12)· patent assignee history

2013–2014Patents assigned to MATSUNAGA HIROSHI (5)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
MITSUBISHI GAS CHEMICAL CO	18	2009–2020
SHIMADA KENJIself	12	2012–2016
IBM	8	1989–2005
UNIV CARNEGIE MELLON	8	2003–2015
MATSUNAGA HIROSHI	5	2013–2014

Locations

Location	Patents	Span
Tokyo, JP	18	2009–2020
Pittsburgh, Pennsylvania, US	15	2000–2019
Yokohama, JP	4	1998–2020
Kawasaki, JP	2	1989–1994
Ueda, JP	2	1984–1989