Inventor

Hana Ishii

Inventor
Tsukuba, JP

Overview

10→
Patents
2014–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 10 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material38%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium21%
H01LSemiconductor devices13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
B05DProcesses for applying fluent materials to surfaces, in general4%
C01BNon-metallic elements4%
C07DHeterocyclic compounds4%
H01JElectric discharge tubes or discharge lamps4%
H10BElectronic memory devices4%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014–2018Patents assigned to AIR LIQUIDE (3)· patent assignee history
2014–2016Patents assigned to GATINEAU JULIEN (3)· patent assignee history
2014–2016Patents assigned to ISHII HANA (3)· patent assignee history
2014–2016Patents assigned to L AIR LIQUIDE SOCIÉTÉ ANONYME POUR L ETUDE ET L EXPL DES PROCÉDÉS GEORGES CLAUDE (2)· patent assignee history
2014–2018Based in Tsukuba, JP· patent location history
2016–2018Patents assigned to L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (5)· patent assignee history
2016–2017Based in Seoul, KR· patent location history
2021Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude52016–2018
AIR LIQUIDE32014–2018
GATINEAU JULIEN32014–2016
ISHII HANAself32014–2016
L AIR LIQUIDE SOCIÉTÉ ANONYME POUR L ETUDE ET L EXPL DES PROCÉDÉS GEORGES CLAUDE22014–2016
Locations
LocationPatentsSpan
Tsukuba, JP62014–2018
Seoul, KR32016–2017
Tokyo, JP12021