LexDanaLexDanabeta
Inventor

Tsuyoshi Moriya

Inventor
Nirasaki, JP

Overview

98→
Patents
2000–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 98 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
H01JElectric discharge tubes or discharge lamps16%
G01NInvestigating or analysing materials by determining their chemical or physical properties8%
C23CCoating metallic material7%
B08BCleaning in general6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
Y10TTechnical subjects covered by former us classification6%
F04DNon-positive-displacement pumps3%
H01LSemiconductor devices3%
F05DIndexing scheme for aspects relating to non-positive-displacement machines or engines, gas-turbines or jet-propulsion plants2%
PatentTitleYear
11,034,225Vehicle door seal structure202110,949,144Communication apparatus that communicates using two frequency bands, one of which including a specific frequency band that requires dynamic frequency selection, and printer202110,887,750Communication apparatus and control method for the same202110,872,764Film forming method202010,805,526Imaging apparatus, imaging method, and computer program product202010,771,754Image white balance correction method and electronic device202010,643,839Film forming apparatus and film forming method202010,491,875Image processing apparatus and image processing method201910,121,680Substrate processing apparatus20189,661,290'Image processing apparatus and method'20179,627,184'Cleaning method of processing apparatus, program for performing the method, and storage medium for storing the program'20179,441,292'Etching method, etching apparatus, and ring member'20169,209,010'Substrate cleaning method and substrate cleaning device'20159,022,225'Filtration filter and production method therefor'20158,945,313'Vacuum exhaust method and a substrate processing apparatus therefor'20158,945,413'Etching method, etching apparatus, and ring member'20158,894,355'Turbomolecular pump, and particle trap for turbomolecular pump'20148,877,002'Internal member of a plasma processing vessel'20148,854,625'Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring'20148,845,853'Substrate processing apparatus and substrate processing method'20148,821,607'Particle capture unit, method for manufacturing the same, and substrate processing apparatus'20148,751,196'Abnormality detection system, abnormality detection method, recording medium, and substrate processing apparatus'20148,727,708'Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing component'20148,608,422'Particle sticking prevention apparatus and plasma processing apparatus'20138,585,831'Substrate cleaning method'20138,578,952'Substrate processing system, substrate surface processing apparatus, substrate surface inspecting apparatus, substrate surface inspecting method, and storage medium storing program for implementing the method'20138,516,715'Evacuation method and storage medium'20138,498,911'Particle generation factor determining system, charging method and storage medium'20138,475,602'Substrate cleaning method and apparatus'20138,475,562'Gas purification apparatus and method'20138,449,715'Internal member of a plasma processing vessel'20138,419,963'Polishing method'20138,404,050'Plasma processing apparatus and method'20138,389,053'Method of cleaning powdery source supply system, storage medium, substrate processing system and substrate processing method'20138,384,902'Optical gas-analysis system and a gas flow cell'20138,382,938'Gate valve cleaning method and substrate processing system'20138,356,970'Exhaust pump, communicating pipe, and exhaust system'20138,337,629'Method for cleaning elements in vacuum chamber and apparatus for processing substrates'20128,323,414'Particle removal apparatus and method and plasma processing apparatus'20128,297,292'Cleaning device and cleaning method of semiconductor manufacturing apparatus'20128,257,498'Substrate transfer module and substrate processing system'20128,260,557'System and method for detecting particle generation source, and storage medium therefor'20128,253,930'Absorption spectrometric apparatus for semiconductor production process'20128,243,265'Method and apparatus for detecting foreign materials and storage medium'20128,236,109'Component cleaning method and storage medium'20128,231,800'Plasma processing apparatus and method'20128,218,145'Particle monitor system and substrate processing apparatus'20128,210,742'Method and apparatus for detecting foreign matter attached to peripheral edge of substrate, and storage medium'20128,206,513'Method for cleaning elements in vacuum chamber and apparatus for processing substrates'20128,208,802'Focusing position determining apparatus, imaging apparatus and focusing position determining method'20128,202,394'Method of manufacturing semiconductor devices and semiconductor manufacturing apparatus'20128,172,949'Substrate processing apparatus, program for performing operation and control method thereof, and computer readable storage medium storing the program'20128,152,907'Gas purification apparatus and method'20128,137,473'Method for cleaning elements in vacuum chamber and apparatus for processing substrates'20128,132,580'Substrate processing system and substrate cleaning apparatus including a jetting apparatus'20128,113,757'Intermediate transfer chamber, substrate processing system, and exhaust method for the intermediate transfer chamber'20128,082,124'Method and system for diagnosing abnormal plasma discharge'20118,062,432'Cleaning method for turbo molecular pump'20118,058,186'Components for substrate processing apparatus and manufacturing method thereof'20118,052,376'Turbo-molecular pump, substrate processing apparatus, and method for suppressing attachment of depositions to turbo-molecular pump'20118,052,798'Particle removal apparatus and method and plasma processing apparatus'20118,048,235'Gate valve cleaning method and substrate processing system'20118,043,971'Plasma processing apparatus, ring member and plasma processing method'20118,012,303'Container cleanliness measurement apparatus and method, and substrate processing system'20117,976,637'Substrate processing system, substrate surface processing apparatus, substrate surface inspecting apparatus, substrate surface inspecting method, and storage medium storing program for implementing the method'20117,969,572'Particle monitor system and substrate processing apparatus'20117,942,975'Ceramic sprayed member-cleaning method'20117,937,178'Charging method for semiconductor device manufacturing apparatus, storage medium storing program for implementing the charging method, and semiconductor device manufacturing apparatus implementing the charging method'20117,927,066'Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing component'20117,913,702'Substrate cleaning method, substrate cleaning apparatus, substrate processing system, substrate cleaning program and storage medium'20117,913,351'Cleaning apparatus and cleaning method'20117,883,779'Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring'20117,852,476'Particle monitor system and substrate processing apparatus'20107,837,432'Exhaust system and exhausting pump connected to a processing chamber of a substrate processing apparatus'20107,797,984'Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring'20107,780,786'Internal member of a plasma processing vessel'20107,756,599'Substrate processing apparatus, program for performing operation and control method thereof, and computer readable storage medium storing the program'20107,748,138'Particle removal method for a substrate transfer mechanism and apparatus'20107,733,502'Roughness evaluation method and system'20107,654,010'Substrate processing system, substrate processing method, and storage medium'20107,651,586'Particle removal apparatus and method and plasma processing apparatus'20107,648,581'Substrate cleaning method, substrate cleaning apparatus, substrate processing system, substrate cleaning program and storage medium'20107,628,864'Substrate cleaning apparatus and method'20097,560,083'Method for removing water molecules from vacuum chamber, program for executing the method, and storage medium storing the program'20097,464,581'Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring'20087,458,247'Vacuum apparatus including a particle monitoring unit, particle monitoring method, and program'20087,416,635'Gas supply member and plasma processing apparatus'20087,347,006'Processing apparatus and method for removing particles therefrom'20087,299,104'Substrate processing apparatus and substrate transferring method'20077,245,364'Apparatus for inspecting a surface of an object to be processed'20077,045,465'Particle-removing method for a semiconductor device manufacturing apparatus'20067,006,682'Apparatus for monitoring particles and method of doing the same'20066,737,666'Apparatus and method for detecting an end point of a cleaning process'20046,423,176'Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particles'20026,346,425'Vapor-phase processing method capable of eliminating particle formation'20026,306,770'Method and apparatus for plasma etching'20016,184,489'Particle-removing apparatus for a semiconductor device manufacturing apparatus and method of removing particles'20016,115,120'System and method for detecting particles produced in a process chamber by scattering light'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2015Based in Tokyo, JP· patent location history
2002–2020Patents assigned to TOKYO ELECTRON LTD (81)· patent assignee history
2007–2018Based in Nirasaki, JP· patent location history
2011–2017Patents assigned to MORIYA TSUYOSHI (46)· patent assignee history
2011–2020Based in Yamanashi, JP· patent location history
2012–2017Patents assigned to NAKAYAMA HIROYUKI (11)· patent assignee history
2012–2017Patents assigned to NAGAIKE HIROSHI (10)· patent assignee history
2012–2014Patents assigned to YAMAWAKU JUN (7)· patent assignee history
2012–2021Based in Yokohama, JP· patent location history
2021Based in Ibara, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD812002–2020
MORIYA TSUYOSHIself462011–2017
NAKAYAMA HIROYUKI112012–2017
NAGAIKE HIROSHI102012–2017
YAMAWAKU JUN72012–2014
Locations
LocationPatentsSpan
Nirasaki, JP582007–2018
Tokyo, JP242000–2015
Yokohama, JP72012–2021
Yamanashi, JP62011–2020
Ibara, JP12021