Inventor
Mirko Vukovic
Inventor
Slingerlands, NY, US
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps33%
C23CCoating metallic material24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
H01LSemiconductor devices10%
G01NInvestigating or analysing materials by determining their chemical or physical properties4%
H05HPlasma technique4%
A61BDiagnosis2%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%
G06TImage data processing or generation, in general2%
H01PWaveguides2%
PatentTitleYear
11,049,700Atmospheric plasma processing systems and methods for manufacture of microelectronic workpieces202110,522,384Electromagnetic wave treatment of a substrate at microwave frequencies using a wave resonator201910,426,001Processing system for electromagnetic wave treatment of a substrate at microwave frequencies201910,256,121Heated stage with variable thermal emissivity method and apparatus201910,215,704Computed tomography using intersecting views of plasma using optical emission spectroscopy during plasma processing20198,568,555'Method and apparatus for reducing substrate temperature variability'20138,435,351'Method and system for measuring a flow rate in a solid precursor delivery system'20138,252,114'Gas distribution system and method for distributing process gas in a processing system'20128,048,226'Method and system for improving deposition uniformity in a vapor deposition system'20117,959,775'Thermal stress-failure-resistant dielectric windows in vacuum processing systems'20117,691,243'Internal antennae for plasma processing with metal plasma'20107,591,232'Internal coil with segmented shield and inductively-coupled plasma source and processing system therewith'20097,537,671'Self-calibrating optical emission spectroscopy for plasma monitoring'20097,314,537'Method and apparatus for detecting a plasma'20087,315,128'Magnetically enhanced capacitive plasma source for ionized physical vapor deposition'20087,255,774'Process apparatus and method for improving plasma production of an inductively coupled plasma'20077,084,573'Magnetically enhanced capacitive plasma source for ionized physical vapor deposition'20066,771,026'Plasma generation by mode-conversion of RF-electromagnetic wave to electron cyclotron wave'20046,719,886'Method and apparatus for ionized physical vapor deposition'20046,652,711'Inductively-coupled plasma processing system'20036,417,626'Immersed inductivelycoupled plasma source'20026,287,435'Method and apparatus for ionized physical vapor deposition'20016,277,250'Dual cathode arrangement for physical vapor deposition of materials onto a round substrate with high aspect ratio features'20016,254,745'Ionized physical vapor deposition method and apparatus with magnetic bucket and concentric plasma and material source'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2021Patents assigned to TOKYO ELECTRON LTD (24)· patent assignee history
2001–2010Based in Gilbert, AZ, US· patent location history
2008–2021Based in Slingerlands, NY, US· patent location history
2012–2013Patents assigned to VUKOVIC MIRKO (3)· patent assignee history
2013Patents assigned to SUZUKI KENJI (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 24 | 2001–2021 |
| VUKOVIC MIRKOself | 3 | 2012–2013 |
| SUZUKI KENJI | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Slingerlands, New York, US | 13 | 2008–2021 |
| Gilbert, AZ, US | 11 | 2001–2010 |