Inventor

Rostislav Rokitski

Inventor
La Jolla, CA, US

Overview

11→
Patents
2013–2020
Patent span
Physics
Primary field (CPC G)

Patents· 11 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices35%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light35%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light13%
G02BOptical elements, systems or apparatus13%
G21KHandling of particles or ionising radiation not otherwise provided for4%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2019Patents assigned to Cymer LLC (10)· patent assignee history
2013–2014Patents assigned to CYMER INC (2)· patent assignee history
2013–2020Based in La Jolla, CA, US· patent location history
2014Patents assigned to RAFAC ROBERT J (1)· patent assignee history
2014Patents assigned to ROKITSKI ROSTISLAV (1)· patent assignee history
2018–2019Based in San Diego, CA, US· patent location history
2020Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
Cymer LLC102013–2019
CYMER INC22013–2014
ASML NETHERLANDS BV12020
RAFAC ROBERT J12014
ROKITSKI ROSTISLAVself12014
Locations
LocationPatentsSpan
La Jolla, California, US82013–2020
San Diego, California, US32018–2019