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Inventor

Takashi Tozawa

Inventor
Yamanashi, JP

Overview

5→
Patents
1993–1997
Patent span
Chemistry
Primary field (CPC C)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
C30BSingle-crystal growth17%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
H01JElectric discharge tubes or discharge lamps8%
PatentTitleYear
5,611,655'Vacuum process apparatus and vacuum processing method'19975,554,249'Magnetron plasma processing system'1996D0365584'Semiconductor manufacturing device'19955,407,350'Heat-treatment apparatus'19955,224,999'Heat treatment apparatus'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–1997Patents assigned to TOKYO ELECTRON LTD (5)· patent assignee history
1993Based in Kofu, JP· patent location history
1995–1997Patents assigned to TEL YAMANISHI KK (2)· patent assignee history
1995Patents assigned to TEL SAGAMI LTD (1)· patent assignee history
1995Patents assigned to YASKAWA DENKI SEISAKUSHO KK (1)· patent assignee history
1995Based in Nirasaki, JP· patent location history
1995Based in Tokyo, JP· patent location history
1996–1997Based in Yamanashi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD51993–1997
TEL YAMANISHI KK21995–1997
TEL SAGAMI LTD11995
YASKAWA DENKI SEISAKUSHO KK11995
Locations
LocationPatentsSpan
Yamanashi, JP21996–1997
Nirasaki, JP11995
Tokyo, JP11995
Kofu, JP11993