Inventor
Takeshi Kinsho
Inventor
Joetsu-shi, JP
Overview
Patents· 226 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices24%
C07CAcyclic or carbocyclic compounds16%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds10%
C07DHeterocyclic compounds9%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium8%
C09KMaterials for miscellaneous applications, not provided for elsewhere5%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
C07BGeneral methods of organic chemistry2%
PatentTitleYear
11,097,999Process for preparing 4-penten-2-ynal202110,954,174Process for preparing (7Z)-7-tricosene202110,882,806Processes for preparing 4-methyl-5-nonanone and 4-methyl-5-nonanol202110,882,805Processes for preparing 4-methyl-5-nonanone and 4-methyl-5-nonanol202110,815,504Method for producing (Z)-2-benzoyloxy-12-heptadecene and (2S,12Z)-2-hydroxy-12-heptadecene and method for producing (2S,12Z)-2-acetoxy-12-heptadecene202010,781,146Process for preparing a 5-alken-1-yne compound, (6Z)-1,1-dialkoxy-6-nonen-2-yne compound, (2E,6Z)-2,6-nonadienal and (2E)-cis-6,7-epoxy-2-nonenal, and 1,1-dialkoxy-6-nonen-2-yne compound202010,781,194Process for preparing (E2)-cis-6,7-epoxy-2-nonenal202010,736,317Composition having sex pheromone activity on San Jose scale, and attractant, mating disruptant, attraction method and mating disruption method for San Jose scale202010,737,9991-haloalkadiene and a process for preparing the same and a process for preparing (9e, 11z)-9,11-hexadecadienyl acetate202010,730,817Process for preparing (E2,Z6)-2,6-nonadienal202010,676,417Method for producing reduced halide compound having undergone reduction of carbon-carbon unsaturated bond202010,662,166Process for preparing (2E,6Z)-2,6-nonadienal and a process for preparing (2E)-cis 6,7-epoxy-2-nonenal202010,618,862Process for preparing (9e, 11z)-9,11-hexadecadienal202010,611,7187-methyl-3-methylene-7-octenal acetal compound and methods for producing aldehyde compound and ester compound using the same202010,494,322Method for producing 3,7-dimethyl-7-octenol and method for producing 3,7-dimethyl-7-octenyl carboxylate compound201910,442,752Method for preparing (7E)-7, 9-decadienoate ester201910,221,123Process for preparing (4Z,7Z)-4,7-decadien-1-yl acetate201910,182,566Sustained release pheromone preparation of vine mealybug and control method using the preparation201910,138,1911-halo-6,9-pentadecadiene and method for producing (7Z,10Z)-7,10-hexadecadienal201810,138,189Methods for producing 2,6-dimethyl-1,5-heptadien-3-ol and 2,6-dimethyl-1,5-heptadien-3-yl acetate201810,138,179Method for producing 2,4-dienal acetal compound and 2,4-dienal compound201810,081,820Method for producing (Z)-2-benzoyloxy-12-heptadecene and (2S,12Z)-2-hydroxy-12-heptadecene and method for producing (2S,12Z)-2-acetoxy-12-heptadecene201810,040,742Method of producing aliphatic aldehyde compound having terminal conjugated diene structure and intermediate therefor20189,969,671Method for producing ethyl 4-methyloctanoate20189,919,994'Alpha-halotetramethycyclohexanone, a method for the preparation thereof, and a method for the preparation of a (2,3,4,4-tetramethylcyclopentyl)methy carboxylate compound'20189,845,304Method for producing asymmetric conjugated diyne compound and method for producing Z,Z-conjugated diene compound using the same20179,845,273Method for producing chlorohydrocarbon having conjugated double bonds20179,822,050'Terminal conjugated trienal acetal compound and method for producing terminal conjugated trienal compound using the same'20179,738,587'Method for producing 2-isopropenyl-5-methyl-4-hexen-1-yl 3-methyl-2-butenoate'20179,725,400'(E)-2-isopropyl-5-methyl-3,5-hexadienoate compound, method for producing the same, and methods for producing (E)-2-isopropyl-5-methyl-3,5-hexadienol and (E)-2-isopropyl-5-methyl-3,5-hexadienyl carboxylate by using the same'20179,708,241'Methods for producing β-cyclolavandulal and derivative of same'20179,688,622'1-(2-acyloxyethyl)cyclopropyl sulfonate compound, 3-halomethyl-3-butenyl carboxylate compound, and method for producing 4-alkyl-3-methylenebutyl carboxylate'20179,670,130'Methods for producing β-cyclolavandulal and derivative of same'20179,611,211'1-(2-acyloxyethyl)cyclopropyl sulfonate compound, 3-halomethyl-3-butenyl carboxylate compound, and method for producing 4-alkyl-3-methylenebutyl carboxylate'20179,550,720'Method for producing an ω-halo-2-alkynal'20179,499,468'3-acyloxymethyl-3-butenyl carboxylate compound and method for producing 4-alkyl-3-methylenebutyl carboxylate'20169,481,619'7-methyl-3-methylene-7-octenyl halide, method for producing the same, and method for producing 7-methyl-3-methylene-7-octenyl propionate'20169,460,934'Wet strip process for an antireflective coating layer'20169,410,951'Method for producing substrate for making microarray'20169,376,368'Method for producing a conjugated Z-alken-yn-yl acetate'20169,372,404'Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymer'20169,278,899'Method for producing 3,5-dimethyldodecanoic acid; and 4-carboxy-3,5-Dimethyl-3,5-dodecadienoic acid'20169,278,900'Method for producing 3,5-dimethyldodecanoic acid'20169,261,783'Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid'20169,255,056'Omega-halo-2-alkynal'20169,126,920'Method for producing 2-isopropylidene-5-methyl-4-hexenyl butyrate'20159,126,923'Method for producing (E)-2-isopropyl-5-methyl-2,4-hexadienyl acetate'20159,076,738'Composition for resist underlayer film, process for forming resist underlayer film, patterning process, and fullerene derivative'20159,069,245'Near-infrared absorptive layer-forming composition and multilayer film'20159,057,949'Patterning process, resist composition, polymer, and polymerizable ester compound'20159,045,587'Naphthalene derivative, resist bottom layer material, and patterning process'20159,046,764'Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition'20159,034,661'Method for producing molecule immobilizing substrate, and molecule immobilizing substrate'20158,999,625'Silicon-containing antireflective coatings including non-polymeric silsesquioxanes'20158,933,251'Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process'20158,877,422'Resist underlayer film composition and patterning process using the same'20148,853,031'Resist underlayer film composition and patterning process using the same'20148,846,846'Naphthalene derivative, resist bottom layer material, and patterning process'20148,835,697'Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning process'20148,835,092'Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative'20148,835,094'Fluoroalcohol, fluorinated monomer, polymer, resist composition and patterning process'20148,795,955'Naphthalene derivative, resist bottom layer material, resist bottom layer forming method, and patterning process'20148,791,290'Acetal compound, polymer, resist composition, and patterning process'20148,791,288'Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process'20148,722,307'Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layer'20148,722,321'Patterning process'20148,697,903'Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid'20148,691,490'Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process'20148,663,898'Resist underlayer film composition and patterning process using the same'20148,609,889'Photoacid generator, resist composition, and patterning process'20138,603,732'Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process'20138,597,869'Sulfonium salt, resist composition, and patterning process'20138,592,956'Resist underlayer film composition and patterning process using the same'20138,592,133'Resist composition and patterning process'20138,586,282'Resist composition and patterning process'20138,541,158'Positive resist compositions and patterning process'20138,431,323'Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process'20138,426,105'Resist-modifying composition and pattern forming process'20138,420,290'Acetal compounds and their preparation, polymers, resist compositions and patterning process'20138,394,570'Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process'20138,349,533'Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process'20138,329,384'Resist-modifying composition and pattern forming process'20128,323,536'Near-infrared absorbing dye, near-infrared absorptive film-forming composition, and near-infrared absorptive film'20128,313,890'Antireflective coating composition, antireflective coating, and patterning process'20128,288,072'Resist lower layer film-formed substrate'20128,283,104'Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same'20128,247,166'Double patterning process'20128,216,766'Polymer, polymer preparation method, resist composition and patterning process'20128,202,677'Chemically-amplified positive resist composition and patterning process thereof'20128,168,367'Resist composition and patterning process'20128,148,053'Method for manufacturing substrate for making microarray'20128,114,570'Photoacid generator, resist composition, and patterning process'20128,114,571'Photoacid generator, resist composition, and patterning process'20128,105,748'Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process'20128,062,828'Positive resist composition and patterning process'20118,062,831'Carboxyl-containing lactone compound, polymer, resist composition, and patterning process'20118,057,982'Monomer, resist composition, and patterning process'20118,057,985'Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process'20118,053,165'Hydroxyl-containing monomer, polymer, resist composition, and patterning process'20118,053,179'Method for manufacturing substrate for making microarray'20118,048,610'Sulfonium salt-containing polymer, resist composition, and patterning process'20118,030,515'Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process'20118,021,822'Positive resist compositions and patterning process'20118,017,302'Positive resist compositions and patterning process'20117,998,657'Ester compounds and their preparation, polymers, resist compositions and patterning process'20117,993,811'Positive resist compositions and patterning process'20117,985,528'Positive resist composition and patterning process'20117,981,589'Fluorinated monomer, fluorinated polymer, resist composition and patterning process'20117,928,262'Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process'20117,919,226'Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process'20117,902,385'Ester compounds and their preparation, polymers, resist compositions and patterning process'20117,879,530'Antireflective coating composition, antireflective coating, and patterning process'20117,871,752'Lactone-containing compound, polymer, resist composition, and patterning process'20117,868,199'Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process'20117,833,694'Lactone-containing compound, polymer, resist composition, and patterning process'20107,807,331'Hydrogenated ring-opening metathesis polymer, resist composition and patterning process'20107,794,915'Hydrogenated ring-opening metathesis polymer, resist composition comprising the same and patterning method'2010RE041580'Lactone-containing compounds, polymers, resist compositions, and patterning method'20107,741,015'Patterning process and resist composition'20107,687,228'Antireflection film composition and patterning process using the same'20107,687,222'Polymerizable ester compounds, polymers, resist compositions and patterning process'20107,678,530'Lactone-containing compound, polymer, resist composition, and patterning process'20107,670,751'Photoacid generator, resist composition, and patterning process'20107,638,256'Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process'20097,611,821'Positive resist compositions and patterning process'20097,592,407'Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process'20097,569,324'Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process'20097,556,909'Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process'20097,531,290'Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process'20097,531,289'Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process'20097,511,169'Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process'20097,491,483'Polymers, positive resist compositions and patterning process'20097,485,408'Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process'20097,378,548'Tertiary amine compounds having an ester structure and processes for preparing the same'20087,312,288'Polymerizable fluorinated ester compounds and their preparing processes'20077,285,368'Polymerizable ester having sulfonamide structure, polymer, resist composition and patterning process'20077,282,316'Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same'20077,276,324'Nitrogen-containing organic compound, resist composition and patterning process'20077,252,925'Nitrogen-containing organic compound, resist composition and patterning process'20077,202,318'Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process'20077,192,684'Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process'20077,169,541'Compound, polymer, resist composition, and patterning process'20077,141,351'Basic compound, resist composition and patterning process'20067,141,352'Basic compound, resist composition and patterning process'20067,132,215'Ester compounds, polymers, resist compositions and patterning process'20067,084,303'Tertiary amine compounds having an ester structure and processes for preparing same'20067,041,846'Alicyclic methacrylate having oxygen substituent group on α-methyl'20067,037,995'Tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process'20067,029,822'Tertiary alcohol compounds having alicyclic structure'20067,012,161'Compound, fluorine-containing polymerizable cyclic olefin compound'20066,962,767'Acetal compound, polymer, resist composition and patterning process'20056,946,233'Polymer, resist material and patterning method'20056,899,990'Epoxy compound having alicyclic structure, polymer, resist composition and patterning process'20056,844,133'Polymer, resist composition and patterning process'20056,830,866'Resist composition and patterning process'20046,794,111'Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation'20046,780,563'Polymer, resist composition and patterning process'20046,774,258'Tertiary alcohol compounds having alicyclic structure'20046,746,818'(Meth)acrylates having lactone structure, polymers, photoresist compositions and patterning process'20046,743,566'Cyclic acetal compound, polymer, resist composition and patterning process'20046,703,183'Polymer, resist composition and patterning process'20046,673,518'Polymer, resist composition and patterning process'20046,673,515'Polymer, resist composition and patterning process'20046,673,517'Polymer, resist composition and patterning process'20046,670,498'Ester compounds, polymers, resist compositions and patterning process'20036,667,145'Resist composition and patterning process'20036,660,448'Polymer, resist composition and patterning process'20036,653,044'Chemical amplification type resist composition'20036,605,408'Resist composition and patterning process'20036,596,463'Ester compounds, polymers, resist compositions and patterning process'20036,586,157'Ester compounds, polymers, resist compositions and patterning process'20036,566,038'Polymers, resist compositions and patterning process'20036,566,037'Polymer, resist composition and patterning process'20036,531,627'Ester compounds, polymers, resist compositions and patterning process'20036,524,765'Polymer, resist composition and patterning process'20036,515,149'Acetal compound, polymer, resist composition and patterning response'20036,515,150'Cyclic acetal compound, polymer, resist composition and patterning process'20036,509,135'Polymer, resist composition and patterning process'20036,509,481'Tetrahydrofuran compounds having alicyclic structure'20036,500,971'Ester compounds having alicyclic and oxirane structures and method for preparing the same'20026,500,961'Lactone compounds having alicyclic structure and their manufacturing method'20026,492,090'Polymers, resist compositions and patterning process'20026,492,089'Polymer, resist composition and patterning process'20026,472,543'Lactone compounds having alicyclic structure and their manufacturing method'20026,469,220'Tertiary alcohol compounds having an alicyclic structure'20026,448,420'Acid-decomposable ester compound suitable for use in resist material'20026,444,396'Ester compounds, polymers, resist composition and patterning process'20026,413,695'Resist compositions and patterning process'20026,403,823'Ester compounds having alicyclic structure and method for preparing same'20026,403,822'Ester compounds having alicyclic structure and method for preparing same'20026,399,274'Resist composition and patterning process'20026,337,415'Process for preparing tetrakis (trimethylsily) silane and tris (trimethysilyl) silane'20026,312,867'Ester compounds, polymers, resist compositions and patterning process'20016,291,696'Preparation of tris (trimethylsilyl) silylethyl esters'20016,284,429'Ester compounds, polymers, resist compositions and patterning process'20016,280,898'Lactone-containing compounds, polymers, resist compositions, and patterning method'20016,147,249'Ester compounds, polymers, resist composition and patterning process'20006,004,478'Silacyclohexane compounds, preparation thereof, liquid crystal compositions comprising the same, and liquid crystal devices comprising the composition'19995,868,961'Silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it'19995,866,037'Liquid crystal compositions and liquid crystal display elements containing same'19995,762,826'Liquid crystal composition and a liquid crystal display element which contains it'19985,693,841'Cyclohexanone compounds, process for preparing the same, and processes for preparing silacyclohexane-based liquid crystal compounds from the cyclohexanone compounds'19975,679,746'Silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it'19975,665,271'Silacyclohexane compounds, preparation thereof, liquid crystal compositions comprising the same, and liquid crystal devices comprising the compositions'19975,659,059'Silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it'19975,650,092'Silacyclohexane compounds, a liquid crystal composition comprising the same and a liquid crystal device comprising the composition'19975,641,430'Silacyclohexane compounds, preparation thereof, liquid crystal compositions comprising the same, and liquid crystal devices comprising the compositions'19975,641,431'Silacyclohexanone compound and a method of preparing a silacyclohexane-type liquid crystal composition containing it'19975,624,601'Silacyclohexane compounds, a liquid crystal composition comprising the same and a liquid crystal device comprising the composition'19975,595,686'Silacyclohexane compounds, a liquid crystal composition comprising the same and a liquid crystal device comprising the composition'19975,582,765'Triflate compounds and process for preparing silacyclohexane-based liquid crystal compounds from the triflate compounds'19965,582,764'Silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it'19965,578,244'Silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it'19965,573,705'Silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it'19965,567,350'Silacyclohexane compound, a method of preparing it and a liquid cyrstal composition containing it'19965,560,866'Process for preparing silacyclohexane compounds'19965,547,606'Silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it'19965,543,539'Silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it'19965,527,490'Silacyclohexane carbaldehyde compounds and processes for preparing silacyclohexane-based liquid crystal compounds from the carbaldehyde compound'19965,523,440'Silacyclohexane compound, a method of preparaing it and a liquid crystal composition containing it'19965,523,439'Process for preparing silacyclohexane compounds'19965,519,156'Cyclohexane carbaldehyde compounds and processes for preparing silacyclohexane-based liquid crystal compounds from the carbaldehyde'19965,514,824'Process for preparing silacyclohexane-base liquid crystal compounds'19965,498,737'Silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it'19965,496,501'Silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it'19965,454,977'Silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995–2021Patents assigned to SHINETSU CHEMICAL CO (222)· patent assignee history
1995–2020Based in Joetsu-shi, JP· patent location history
1996–2021Based in Niigata, JP· patent location history
1996–2010Based in Kubiki-mura, JP· patent location history
2001–2006Based in Nishikamo-gun, JP· patent location history
2011–2016Patents assigned to KINSHO TAKESHI (47)· patent assignee history
2011–2015Patents assigned to WATANABE TAKERU (28)· patent assignee history
2011–2015Patents assigned to OHASHI MASAKI (16)· patent assignee history
2011–2014Patents assigned to HATAKEYAMA JUN (12)· patent assignee history
2012–2016Based in Jyoetsu, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 222 | 1995–2021 |
| KINSHO TAKESHIself | 47 | 2011–2016 |
| WATANABE TAKERU | 28 | 2011–2015 |
| OHASHI MASAKI | 16 | 2011–2015 |
| HATAKEYAMA JUN | 12 | 2011–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Joetsu-shi, JP | 99 | 1995–2020 |
| Niigata, JP | 66 | 1996–2021 |
| Nishikamo-gun, JP | 31 | 2001–2006 |
| Jyoetsu, JP | 18 | 2012–2016 |
| Kubiki-mura, JP | 8 | 1996–2010 |