Inventor

Sungjae Lee

Inventor
Burlington, VT, US

Overview

31→
Patents
2010–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 31 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary
H10DInorganic electric semiconductor devices15%
H01LSemiconductor devices14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
LOC159%
G06FElectric digital data processing8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
G01KMeasuring temperature3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G05DSystems for controlling or regulating non-electric variables3%
G06TImage data processing or generation, in general3%
PatentTitleYear
10,688,485Substrate analysis nozzle and method for analyzing substrate202010,658,495Vertical fin type bipolar junction transistor (BJT) device with a self-aligned base contact202010,592,454System-on-chip, mobile terminal, and method for operating the system-on-chip202010,481,419Physically contactable graphene electro-optic modulator and method for manufacturing the same2019D0835868Cleaner201810,103,083Integrated circuits with Peltier cooling provided by back-end wiring201810,082,732Electronic device case and surface treatment method thereof201810,025,741System-on-chip, mobile terminal, and method for operating the system-on-chip201810,012,693System on chip and secure debugging method20189,991,901Method of optimizing CMOS IDAC linearity performance using golden ratio20189,990,454Early analysis and mitigation of self-heating in design flows20189,928,335'Temperature-compliant integrated circuits'20189,773,717'Integrated circuits with peltier cooling provided by back-end wiring'20179,741,627'Substrate etching apparatus and substrate analysis method'20179,703,301'Methods and control systems of resistance adjustment of resistors'2017D0776373'Washing machine'2017D0775441'Door for washing machine'20169,530,798'High performance heat shields with reduced capacitance'20169,508,826'Replacement gate structure for enhancing conductivity'20169,484,246'Buried signal transmission line'20169,450,072'Replacement gate structure for enhancing conductivity'20169,418,982'Multi-layered integrated circuit with selective temperature coefficient of resistance'20169,412,759'CMOS gate contact resistance reduction'20169,400,511'Methods and control systems of resistance adjustment of resistors'2016D0759909'Washing machine'2016D0753353'Washing machine'2016D0730596'Washing machine'2015D0704978'Oven'2014D0703395'Dish washer'20147,791,160'High-performance FET device layout'20107,689,946'High-performance FET device layout'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2020Patents assigned to IBM (8)· patent assignee history
2010–2018Based in Burlington, VT, US· patent location history
2014–2020Patents assigned to SAMSUNG ELECTRONICS CO LTD (12)· patent assignee history
2014–2018Based in Yongin-si, KR· patent location history
2016–2018Patents assigned to GLOBALFOUNDRIES INC (8)· patent assignee history
2016–2018Based in Schenectady, NY, US· patent location history
2016–2018Based in Gwangmyeong-si, KR· patent location history
2017–2020Patents assigned to IAS INC (2)· patent assignee history
2018Patents assigned to GLOBAL FOUNDRIES INC (1)· patent assignee history
2018–2020Based in Seoul, KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SAMSUNG ELECTRONICS CO LTD122014–2020
GLOBALFOUNDRIES INC82016–2018
IBM82010–2020
IAS INC22017–2020
GLOBAL FOUNDRIES INC12018
Locations
LocationPatentsSpan
Burlington, VT, US92010–2018
Schenectady, New York, US62016–2018
Yongin-si, KR62014–2018
Seoul, KR42018–2020
Gwangmyeong-si, KR32016–2018