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Inventor

DANIEL NATHAN BURBANK

Inventor
US

Overview

2→
Patents
2021–2026
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
12,535,745Lithographic apparatus, locking device, and method202611,204,558Particle suppression systems and methods2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2026Patents assigned to ASML HOLDING NV (2)· patent assignee history
2021Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history
2021–2026Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML HOLDING NV22021–2026
ASML NETHERLANDS BV12021
Locations
LocationPatentsSpan
US22021–2026