Inventor

Takako Ogasawara

Inventor

Tokyo, JP

Overview

1998–2012

Patent span

General tagging of new technological developments

Primary field (CPC Y)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C02Fprimary

C02FTreatment of water, waste water, sewage, or sludge37%

Y02WClimate change mitigation technologies related to wastewater treatment or waste management37%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests26%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1998–2000Patents assigned to HITACHI PLANT ENG & CONSTR CO (5)· patent assignee history

1998–2012Based in Tokyo, JP· patent location history

1999–2008Based in Chiyoda-ku, JP· patent location history

2008–2012Patents assigned to HITACHI PLANT TECHNOLOGIES LTD (2)· patent assignee history

2012Patents assigned to OGASAWARA TAKAKO (1)· patent assignee history

2012Patents assigned to PARK HO-DONG (1)· patent assignee history

2012Patents assigned to SUMINO TATSUO (1)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
HITACHI PLANT ENG & CONSTR CO	5	1998–2000
HITACHI PLANT TECHNOLOGIES LTD	2	2008–2012
OGASAWARA TAKAKOself	1	2012
PARK HO-DONG	1	2012
SUMINO TATSUO	1	2012

Locations

Location	Patents	Span
Tokyo, JP	5	1998–2012
Chiyoda-ku, JP	2	1999–2008