Inventor

Marco Jan-Jaco Wieland

Inventor

Delft, NL

Overview

2005–2021

Patent span

Electricity

Primary field (CPC H)

Patents· 68 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary

H01JElectric discharge tubes or discharge lamps27%

B82YSpecific uses or applications of nanostructures23%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%

H01LSemiconductor devices3%

A61FFilters implantable into blood vessels3%

G21KHandling of particles or ionising radiation not otherwise provided for3%

A61BDiagnosis2%

A61CDentistry2%

A61MDevices for introducing media into, or onto, the body2%

PatentTitleYear

11,094,426Vacuum chamber arrangement for charged particle beam generator2021 10,692,696Deflection scan speed adjustment during charged particle exposure2020 RE048046Lithography system, sensor and measuring method2020 10,600,733Fabricating unique chips using a charged particle multi-beamlet lithography system2020 10,586,625Vacuum chamber arrangement for charged particle beam generator2020 10,441,399Medical device comprising an artificial contractile structure2019 10,418,324Fabricating unique chips using a charged particle multi-beamlet lithography system2019 10,321,912Medical device including an artificial contractile structure2019 10,297,420Charged particle lithography system2019 10,110,343Method and encoding device for encoding a sequence of m-bit pattern words and outputting a frame comprising corresponding n-bit symbols2018 10,078,274Method and arrangement for handling and processing substrates2018 10,079,206Fabricating unique chips using a charged particle multi-beamlet lithography system2018 9,978,562Method for exposing a wafer2018 9,905,322'Multi-electrode electron optics'2018 9,901,433'Medical device comprising an artificial contractile structure'2018 9,887,707'Method and device for generating a decoded and synchronized output'2018 9,717,579'Medical device comprising an artificial contractile structure'2017 9,691,589'Dual pass scanning'2017 9,460,260'Enhanced stitching by overlap dose and feature reduction'2016 9,460,954'Method of clamping a substrate and clamp preparation unit using capillary clamping force'2016 9,362,084'Electro-optical element for multiple beam alignment'2016 9,355,751'Multi-electrode stack arrangement'2016 9,305,747'Data path for lithography apparatus'2016 9,184,026'Proximity effect correction in a charged particle lithography system'2015 9,165,693'Multi-electrode cooling arrangement'2015 9,105,439'Projection lens arrangement'2015 9,095,341'Medical device comprising an artificial contractile structure'2015 RE045552'Lithography system and projection method'2015 8,987,677'Charged particle multi-beamlet lithography system, modulation device, and method of manufacturing thereof'2015 8,921,758'Modulation device and charged particle multi-beamlet lithography system using the same'2014 8,916,837'Charged particle lithography system with intermediate chamber'2014 8,890,094'Projection lens arrangement'2014 8,890,095'Reliability in a maskless lithography system'2014 8,884,255'Data path for lithography apparatus'2014 RE045206'Lithography system, sensor and measuring method'2014 8,859,983'Method of and system for exposing a target'2014 8,841,636'Modulation device and charged particle multi-beamlet lithography system using the same'2014 RE045049'Electron beam exposure system'2014 8,759,787'Charged particle multi-beamlet lithography system with modulation device'2014 RE044908'Electron beam exposure system'2014 8,653,485'Projection lens arrangement'2014 8,618,496'Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams'2013 8,604,411'Charged particle beam modulator'2013 8,598,544'Method of generating a two-level pattern for lithographic processing and pattern generator using the same'2013 8,586,949'Charged particle lithography system with intermediate chamber'2013 8,558,196'Charged particle lithography system with aperture array cooling'2013 8,502,174'Method of and system for exposing a target'2013 8,502,176'Imaging system'2013 8,492,731'Charged particle multi-beamlet lithography system with modulation device'2013 RE044240'Electron beam exposure system'2013 8,445,869'Projection lens arrangement'2013 8,325,321'Lithography system, method of heat dissipation and frame'2012 8,258,484'Beamlet blanker arrangement'2012 8,242,467'Lithography system and projection method'2012 8,242,470'Optical switching in a lithography system'2012 8,241,036'Implant with a ceramic coating, and method for ceramic coating of an implant'2012 8,089,056'Projection lens arrangement'2012 8,029,283'Abutment with a hydroxylated surface'2011 7,868,300'Lithography system, sensor and measuring method'2011 7,842,936'Lithography system and projection method'2010 7,827,694'Method for manufacturing one-piece dental device'2010 7,718,100'Dental device and method to manufacture the same'2010 7,709,815'Lithography system and projection method'2010 7,091,504'Electron beam exposure system'2006 7,084,414'Charged particle beamlet exposure system'2006 7,019,908'Modulator circuitry'2006 6,897,458'Electron beam exposure system'2005 6,844,560'Lithography system comprising a converter plate and means for protecting the converter plate'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2019Patents assigned to MAPPER LITHOGRAPHY IP BV (53)· patent assignee history

2005–2021Based in Delft, NL· patent location history

2010–2019Based in Basel, CH· patent location history

2012–2017Patents assigned to WIELAND MARCO JAN-JACO (25)· patent assignee history

2012–2014Patents assigned to VAN VEEN ALEXANDER HENDRIK VINCENT (13)· patent assignee history

2012–2016Patents assigned to STEENBRINK STIJN WILLEM HERMAN KAREL (9)· patent assignee history

2012–2015Patents assigned to KRUIT PIETER (8)· patent assignee history

2015–2019Based in Bale, CH· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
MAPPER LITHOGRAPHY IP BV	53	2005–2019
WIELAND MARCO JAN-JACOself	25	2012–2017
VAN VEEN ALEXANDER HENDRIK VINCENT	13	2012–2014
STEENBRINK STIJN WILLEM HERMAN KAREL	9	2012–2016
KRUIT PIETER	8	2012–2015

Locations

Location	Patents	Span
Delft, NL	59	2005–2021
Basel, CH	6	2010–2019
Bale, CH	3	2015–2019