Inventor
Lawrence P. Muray
Inventor
Moraga, CA, US
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps40%
G02BOptical elements, systems or apparatus12%
B81BMicrostructural devices or systems, e.g. micromechanical devices9%
B82YSpecific uses or applications of nanostructures7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
G01NInvestigating or analysing materials by determining their chemical or physical properties5%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling2%
G01BMeasuring length, thickness or similar linear dimensions2%
G01QScanning-probe techniques or apparatus2%
PatentTitleYear
10,545,099Ultra-high sensitivity hybrid inspection with full wafer coverage capability202010,438,769Array-based characterization tool201910,026,588Imaging apparatus having a plurality of movable beam columns, and method of inspecting a plurality of regions of a substrate intended to be substantially identical20189,099,276'High-voltage energy-dispersive spectroscopy using a low-voltage scanning electron microscope'20158,115,168'Layered scanning charged particle apparatus package having an embedded heater'20128,110,801'Layered scanning charged particle microscope package for a charged particle and radiation detector'20128,106,358'Layered scanning charged particle microscope with differential pumping aperture'20128,003,952'Integrated deflectors for beam alignment and blanking in charged particle columns'20117,335,895'Stacked lens structure and method of use thereof for preventing electrical breakdown'20087,332,729'System and method for multiple electron, ion, and photon beam alignment'20087,109,486'Layered electron beam column and method of use thereof'20067,045,794'Stacked lens structure and method of use thereof for preventing electrical breakdown'20066,805,454'MEMS structure with mechanical overdeflection limiter'20046,791,742'MEMS structure with raised electrodes'20046,693,735'MEMS structure with surface potential control'20046,641,273'MEMS structure with mechanical overdeflection limiter'20036,555,829'High precision flexure stage'20036,369,385'Integrated microcolumn and scanning probe microscope arrays'20026,288,401'Electrostatic alignment of a charged particle beam'20016,195,214'Microcolumn assembly using laser spot welding'20015,155,412'Method for selectively scaling a field emission electron gun and device formed thereby'1992Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1992Based in Katonah, NY, US· patent location history
2001–2020Based in Moraga, CA, US· patent location history
2003–2004Patents assigned to GLIMMERGLASS NETWORKS INC (4)· patent assignee history
2006–2008Patents assigned to NOVELX INC (4)· patent assignee history
2011–2012Patents assigned to AGILENT TECHNOLOGIES INC (4)· patent assignee history
2012Patents assigned to MURAY LAWRENCE P (3)· patent assignee history
2012Patents assigned to SPALLAS JAMES P (3)· patent assignee history
2019Based in Milpitas, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AGILENT TECHNOLOGIES INC | 4 | 2011–2012 |
| GLIMMERGLASS NETWORKS INC | 4 | 2003–2004 |
| NOVELX INC | 4 | 2006–2008 |
| MURAY LAWRENCE Pself | 3 | 2012 |
| SPALLAS JAMES P | 3 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Moraga, California, US | 19 | 2001–2020 |
| Milpitas, California, US | 1 | 2019 |
| Katonah, New York, US | 1 | 1992 |