Inventor
TOMONORI TAKAHASHI
Inventor
JP
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
H01LSemiconductor devices20%
C11DDetergent compositions13%
C23FNon-mechanical removal of metallic material from surface13%
C09KMaterials for miscellaneous applications, not provided for elsewhere9%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
C23GCleaning or de-greasing of metallic material by chemical methods other than electrolysis5%
G11CStatic stores3%
B01DSeparation2%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry2%
PatentTitleYear
12,481,218Treatment liquid, method for washing substrate, and method for removing resist202512,275,921Treatment liquid and substrate treatment method202512,264,275Treatment liquid202512,234,399Chemical solution, method for manufacturing chemical solution, and method for treating substrate202512,104,108Etching compositions202412,027,203Semiconductor memory device to hold 5-bits of data per memory cell202411,899,369Treatment liquid, method for washing substrate, and method for removing resist202411,859,119Chemical liquid and method for treating object to be treated202411,732,190Chemical solution, method for manufacturing chemical solution, and method for treating substrate202311,699,486Semiconductor memory device to hold 5-bits of data per memory cell202311,639,487Cleaning formulation for removing residues on surfaces202311,618,867Cleaning formulation for removing residues on surfaces202311,505,743Chemical solution and method for treating substrate202211,499,099Etching composition202211,479,863Chemical solution and method for treating substrate202211,410,859Treatment liquid202211,412,607Atomic beam generator, bonding apparatus, surface modification method, and bonding method202211,401,487Cleaning formulation for removing residues on surfaces202211,397,383Treatment liquid, method for washing substrate, and method for removing resist202211,361,820Semiconductor memory device to hold 5-bits of data per memory cell202211,286,444Cleaning formulation for removing residues on surfaces202211,274,250Chemical solution and method for treating substrate202211,239,093Method for treating substrate, method for manufacturing semiconductor device, and kit for treating substrate202211,225,633Treatment liquid, method for washing substrate, and method for removing resist2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to FUJIFILM CORP (14)· patent assignee history
2022–2024Patents assigned to FUJIFILM ELECTRONIC MAT USA INC (6)· patent assignee history
2022–2024Patents assigned to KIOXIA CORP (3)· patent assignee history
2022Patents assigned to FUJIFILM ELECTRONICS MAT U S A INC (1)· patent assignee history
2022Patents assigned to NATIONAL UNIV CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH SYSTEM (1)· patent assignee history
2022–2025Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJIFILM CORP | 14 | 2022–2025 |
| FUJIFILM ELECTRONIC MAT USA INC | 6 | 2022–2024 |
| KIOXIA CORP | 3 | 2022–2024 |
| FUJIFILM ELECTRONICS MAT U S A INC | 1 | 2022 |
| NATIONAL UNIV CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH SYSTEM | 1 | 2022 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 24 | 2022–2025 |