Inventor

Yuji Kamikawa

Inventor

Tosu, JP

Overview

1993–2020

Patent span

Electricity

Primary field (CPC H)

Patents· 86 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1036%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests27%

B08BCleaning in general16%

H01LSemiconductor devices3%

G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein2%

B01BBoiling1%

B01DSeparation1%

F26BDrying solid materials or objects by removing liquid therefrom1%

B01FMixing, e.g. dissolving, emulsifying or dispersing1%

B24BMachines, devices, or processes for grinding or polishing1%

PatentTitleYear

10,700,166Nozzle cleaning device, nozzle cleaning method, and substrate processing apparatus2020 9,358,588'Substrate cleaning method, substrate cleaning system and program storage medium'2016 9,305,818'Substrate processing apparatus'2016 9,236,280'Substrate processing apparatus, substrate processing method, and storage medium'2016 9,046,866'Cleaning device and image forming apparatus'2015 9,004,079'Substrate processing apparatus'2015 9,003,674'Evaporator, evaporation method and substrate processing apparatus'2015 8,944,078'Substrate processing apparatus, substrate processing method and storage medium'2015 8,851,819'Substrate processing apparatus'2014 8,744,302'Cleaning device, image forming apparatus, and transfer unit including pressing unit'2014 8,577,502'Liquid processing apparatus, liquid processing method, computer program, and storage medium'2013 8,567,417'Ultrasonic cleaning apparatus, ultrasonic cleaning method, and storage medium storing computer program for executing ultrasonic cleaning method'2013 8,567,089'Evaporator, evaporation method and substrate processing apparatus'2013 8,491,726'Liquid processing apparatus and process liquid supplying method'2013 8,371,318'Liquid processing apparatus, liquid processing method, and storage medium'2013 8,347,901'Substrate cleaning method, substrate cleaning system and program storage medium'2013 8,303,724'Substrate processing method and non-transitory storage medium for carrying out such method'2012 8,281,498'Evaporator, evaporation method and substrate processing apparatus'2012 8,268,087'Liquid processing apparatus, liquid processing method, and storage medium'2012 8,201,567'Liquid treating apparatus'2012 8,152,928'Substrate cleaning method, substrate cleaning system and program storage medium'2012 8,015,984'Substrate processing apparatus including a drying mechanism using a fluid mixture of purified water and a volatile organic solvent'2011 8,002,511'Batch forming apparatus, substrate processing system, batch forming method, and storage medium'2011 7,972,468'Semiconductor device fabricating system'2011 7,637,029'Vapor drying method, apparatus and recording medium for use in the method'2009 7,593,625'Fluid heating apparatus'2009 7,412,981'Liquid processing apparatus and method'2008 7,404,409'Substrate processing system and substrate processing method'2008 7,347,214'Rotary shaft sealing mechanism and liquid processing apparatus'2008 7,337,792'Liquid processing apparatus and liquid processing method'2008 7,314,054'Liquid processing apparatus with nozzle having planar ejecting orifices'2008 7,284,560'Liquid processing apparatus'2007 7,191,785'Substrate processing apparatus for resist film removal'2007 6,895,979'Processing apparatus and processing method'2005 6,861,371'Substrate processing system and substrate processing method'2005 6,799,586'Substrate processing method'2004 6,792,958'System for processing substrate with liquid'2004 6,776,173'Liquid processing apparatus'2004 6,746,543'Apparatus for and method of cleaning objects to be processed'2004 6,743,297'Rotary substrate processing apparatus and method'2004 6,725,868'Liquid processing apparatus'2004 6,708,702'Liquid processing apparatus with storage tank having an internal and external tank'2004 6,698,439'Processing apparatus with sealing mechanism'2004 6,647,642'Liquid processing apparatus and method'2003 6,613,692'Substrate processing method and apparatus'2003 6,592,678'Cleaning method and cleaning equipment'2003 6,589,359'Cleaning method and cleaning apparatus for substrate'2003 6,578,592'Processing apparatus with horizontally movable enclosing element'2003 6,575,178'Cleaning and drying method and apparatus'2003 6,536,452'Processing apparatus and processing method'2003 6,532,975'Substrate processing apparatus and substrate processing method'2003 6,510,859'Apparatus and method for cleaning and drying object'2003 6,495,215'Method and apparatus for processing substrate'2002 6,491,045'Apparatus for and method of cleaning object to be processed'2002 6,435,199'Treatment apparatus'2002 6,413,355'Apparatus for and method of cleaning objects to be processed'2002 6,394,110'Substrate processing apparatus and substrate processing method'2002 6,375,758'Cleaning and drying method and apparatus for objects to be processed'2002 6,357,458'Cleaning apparatus and cleaning method'2002 6,342,104'Method of cleaning objects to be processed'2002 6,318,386'Treatment apparatus'2001 6,319,329'Method of cleaning objects to be processed'2001 6,299,696'Substrate processing apparatus and substrate processing method'2001 6,247,479'Washing/drying process apparatus and washing/drying process method'2001 6,241,827'Method for cleaning a workpiece'2001 6,171,403'Cleaning and drying apparatus, wafer processing system and wafer processing method'2001 6,164,297'Cleaning and drying apparatus for objects to be processed'2000 6,158,447'Cleaning method and cleaning equipment'2000 6,158,449'Cleaning and drying method and apparatus'2000 6,131,588'Apparatus for and method of cleaning object to be processed'2000 6,119,367'System for drying semiconductor wafers using ultrasonic or low frequency vibration'2000 6,109,278'Liquid treatment method and apparatus'2000 6,082,381'Treatment apparatus'2000 6,068,002'Cleaning and drying apparatus, wafer processing system and wafer processing method'2000 6,050,275'Apparatus for and method of cleaning objects to be processed'2000 6,045,624'Apparatus for and method of cleaning objects to be processed'2000 6,029,371'Drying treatment method and apparatus'2000 6,009,890'Substrate transporting and processing system'2000 5,940,985'Apparatus and method for drying substrates'1999 5,922,138'Liquid treatment method and apparatus'1999 5,862,823'Substrate cleaning method and a substrate cleaning apparatus'1999 5,488,964'Washing apparatus, and washing method'1996 5,381,808'Cleaning treatment apparatus'1995 5,248,022'Driving device having sealing mechanism'1993 5,226,437'Washing apparatus'1993 5,213,118'Treatment apparatus'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–2020Patents assigned to TOKYO ELECTRON LTD (83)· patent assignee history

1993Patents assigned to TEL KYUSHU KK (3)· patent assignee history

1999–2005Based in Suwa, JP· patent location history

1999–2015Based in Kumamoto, JP· patent location history

2000–2002Based in Kikuchi-gun, JP· patent location history

2001–2016Based in Tosu, JP· patent location history

2012–2016Patents assigned to KAMIKAWA YUJI (16)· patent assignee history

2012–2016Patents assigned to NAKASHIMA MIKIO (3)· patent assignee history

2012–2013Patents assigned to SHINDO NAOKI (3)· patent assignee history

2013–2020Based in Koshi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TOKYO ELECTRON LTD	83	1993–2020
KAMIKAWA YUJIself	16	2012–2016
NAKASHIMA MIKIO	3	2012–2016
SHINDO NAOKI	3	2012–2013
TEL KYUSHU KK	3	1993

Locations

Location	Patents	Span
Tosu, JP	33	2001–2016
Suwa, JP	26	1999–2005
Kumamoto, JP	7	1999–2015
Kikuchi-gun, JP	6	2000–2002
Koshi, JP	5	2013–2020