Inventor
KARL FREDERICK LEESER
Inventor
US
Overview
Patents· 27 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps28%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
C23CCoating metallic material15%
H01LSemiconductor devices13%
H03HImpedance networks, e.g. resonant circuits9%
H05BElectric heating3%
H05HPlasma technique3%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling1%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form1%
C04BLime, magnesia1%
PatentTitleYear
12,586,757Modular recipe controlled calibration (MRCC) apparatus used to balance plasma in multiple station system202612,581,875Processing tool capable for forming carbon layers on substrates202612,482,636Process module chamber providing symmetric RF return path202512,394,601Impedance transformation in radio-frequency-assisted plasma generation202512,371,781In situ protective coating of chamber components for semiconductor processing202512,368,029Lamellar ceramic structure202512,322,641Mechanical indexer for multi-station process module202512,322,582Anomalous plasma event detection and mitigation in semiconductor processing202512,315,705Distortion of pulses for wafer biasing202512,308,216Mechanical suppression of parasitic plasma in substrate processing chamber202512,217,939RF tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucks202512,215,989Differential-pressure-based flow meters202512,211,685Joining techniques for composite ceramic bodies202512,136,938Closed-loop multiple-output radio frequency (RF) matching202411,996,301Modular-component system for gas delivery202411,984,298Impedance transformation in radio-frequency-assisted plasma generation202411,862,435Mechanical suppression of parasitic plasma in substrate processing chamber202411,837,443Showerhead faceplate having flow apertures configured for hollow cathode discharge suppression202311,725,282Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region202311,699,610Rotational indexer with additional rotational axes202311,621,150Mechanical suppression of parasitic plasma in substrate processing chamber202311,594,397Modular recipe controlled calibration (MRCC) apparatus used to balance plasma in multiple station system202311,557,460Radio frequency (RF) signal source supplying RF plasma generator and remote plasma generator202311,515,124Showerhead faceplate having flow apertures configured for hollow cathode discharge suppression202211,482,436Rotational indexer with additional rotational axes202211,434,567Substrate processing system with tandem source activation for CVD202211,183,368RF tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucks2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to LAM RES CORP (26)· patent assignee history
2021–2026Based in US· patent location history
2023Patents assigned to NOVELLUS SYSTEMS INC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 26 | 2021–2026 |
| NOVELLUS SYSTEMS INC | 1 | 2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 27 | 2021–2026 |