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Inventor

Henk Krus

Inventor
Waalre, NL

Overview

2→
Patents
2006–2007
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
7,271,873'Lithographic apparatus and device manufacturing method'20077,072,021'Lithographic apparatus and device manufacturing method'2006

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006–2007Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2006–2007Based in Waalre, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22006–2007
Locations
LocationPatentsSpan
Waalre, NL22006–2007