LexDanaLexDanabeta
Inventor

Jincheng PEI

Inventor
CN

Overview

2→
Patents
2022–2024
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
G01BMeasuring length, thickness or similar linear dimensions25%
G01NInvestigating or analysing materials by determining their chemical or physical properties25%
PatentTitleYear
11,874,102Thick photo resist layer metrology target202411,360,398System and method for tilt calculation based on overlay metrology measurements2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2024Patents assigned to KLA CORP (2)· patent assignee history
2022–2024Based in CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
KLA CORP22022–2024
Locations
LocationPatentsSpan
CN22022–2024