Inventor
Alexander R. Fox
Inventor
Portland, OR, US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
C23CCoating metallic material23%
H01LSemiconductor devices23%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1018%
B08BCleaning in general5%
H10DInorganic electric semiconductor devices5%
PatentTitleYear
10,825,679Selective growth of SIO2 on dielectric surfaces in the presence of copper202010,763,108Geometrically selective deposition of a dielectric film202010,662,526Method for selective deposition using a base-catalyzed inhibitor202010,643,889Pre-treatment method to improve selectivity in a selective deposition process202010,460,930Selective growth of SiO2 on dielectric surfaces in the presence of copper201910,240,236Clean resistant windows for ultraviolet thermal processing2019Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2019–2020Patents assigned to LAM RES CORP (6)· patent assignee history
2019–2020Based in Portland, OR, US· patent location history
2020Patents assigned to LAM RASEARCH CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 6 | 2019–2020 |
| LAM RASEARCH CORP | 1 | 2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Portland, OR, US | 6 | 2019–2020 |