Inventor
Sung Koo Lee
Inventor
Seoul, KR
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests15%
C11DDetergent compositions4%
H10KOrganic electric solid-state devices4%
B60RVehicles, vehicle fittings, or vehicle parts, not otherwise provided for2%
C07CAcyclic or carbocyclic compounds2%
C07DHeterocyclic compounds2%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds2%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds2%
PatentTitleYear
10,315,577Side mirror for vehicle20199,570,680'Method for fabricating electronic devices having semiconductor memory unit'20178,609,544'Method for fabricating semiconductor device'20138,158,528'Method for forming pattern of semiconductor device'20127,807,336'Method for manufacturing semiconductor device'20107,759,052'Anti-reflective polymer, anti-reflective composition containing the same, and method for forming pattern using the same'20107,749,680'Photoresist composition and method for forming pattern of a semiconductor device'20107,655,568'Method for manufacturing underlying pattern of semiconductor device'20107,563,753'Cleaning solution for removing photoresist'20097,507,485'Organic electroluminescent device'20097,238,653'Cleaning solution for photoresist and method for forming pattern using the same'20077,235,349'Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator'20077,220,679'Method for forming patterns in a semiconductor device'20077,138,218'Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator'20067,081,325'Photoresist polymer and photoresist composition including the same'20066,764,964'Method for forming patterns of a semiconductor device'20046,703,323'Method of inhibiting pattern collapse using a relacs material'20046,682,782'Organic compound having an acetylene group, vacuum deposition polymerization thereof, deposited polymerized thin film, and electroluminescence device containing same'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2013Patents assigned to HYNIX SEMICONDUCTOR INC (14)· patent assignee history
2004Patents assigned to KOREA RES INST CHEM TECH (1)· patent assignee history
2004–2013Based in Seoul, KR· patent location history
2004Based in Bundang-gu, KR· patent location history
2009Patents assigned to LG DISPLAY CO LTD (1)· patent assignee history
2009Based in Kyonggi-do, KR· patent location history
2012–2013Patents assigned to LEE SUNG KOO (2)· patent assignee history
2017Based in Icheon-si, KR· patent location history
2019Patents assigned to BULLSONE CO LTD (1)· patent assignee history
2019Based in Incheon, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HYNIX SEMICONDUCTOR INC | 14 | 2004–2013 |
| LEE SUNG KOOself | 2 | 2012–2013 |
| BULLSONE CO LTD | 1 | 2019 |
| KOREA RES INST CHEM TECH | 1 | 2004 |
| LG DISPLAY CO LTD | 1 | 2009 |
Locations
| Location | Patents | Span |
|---|---|---|
| Seoul, KR | 14 | 2004–2013 |
| Incheon, KR | 1 | 2019 |
| Icheon-si, KR | 1 | 2017 |
| Kyonggi-do, KR | 1 | 2009 |
| Bundang-gu, KR | 1 | 2004 |