Inventor
Keiji Yamada
Inventor
Tokyo, JP
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps19%
G06VImage or video recognition or understanding13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
B65GTransport or storage devices, e.g. conveyors for loading or tipping, shop conveyor systems or pneumatic tube conveyors6%
C23CCoating metallic material6%
H01LSemiconductor devices6%
LOC106%
B82YSpecific uses or applications of nanostructures3%
C09KMaterials for miscellaneous applications, not provided for elsewhere3%
F01NGas-flow silencers or exhaust apparatus for machines or engines in general3%
PatentTitleYear
10,446,427Conveyance system and conveyance method201910,354,902Conveyance system2019D0686095'Digital display device for surface-roughness measuring instruments'2013D0686096'Digital display device for surface-roughness measuring instruments'20138,359,908'Surface texture measuring device'20137,629,092'Exposure system, exposure method and semiconductor device manufacturing method'20097,199,859'Exposure equipment and control method of the same'20076,834,121'Apparatus for rough classification of words, method for rough classification of words, and record medium recording a control program thereof'20046,697,536'Document image scanning apparatus and method thereof'20046,327,384'Character recognition apparatus and method for recognizing characters'20016,122,402'Pattern encoding and decoding method and encoder and decoder using the method'20006,090,457'Process of making a thin film'20006,083,365'Method for forming a thin film and apparatus for the same'20005,992,560'Muffler for internal combustion engine'19995,958,141'Dry etching device'19995,943,440'Method for segmenting joined character patterns for use in a character recognition system'19995,631,113'Electron-beam exposure system for reduced distortion of electron beam spot'19975,444,257'Electron-beam exposure system for reduced distortion of electron beam spot'19955,232,973'High-temperature gasket'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995–2007Patents assigned to FUJITSU LTD (3)· patent assignee history
1995–1997Patents assigned to FUJITSU VLSI LTD (2)· patent assignee history
1997–2009Based in Kawasaki, JP· patent location history
1999–2004Patents assigned to NEC CORP (5)· patent assignee history
1999–2004Based in Tokyo, JP· patent location history
1999–2000Based in Osaka, JP· patent location history
2013Patents assigned to MITUTOYO CORP (3)· patent assignee history
2013Patents assigned to YAMADA KEIJI (3)· patent assignee history
2013Based in Kure, JP· patent location history
2019Based in Toyohashi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NEC CORP | 5 | 1999–2004 |
| FUJITSU LTD | 3 | 1995–2007 |
| MITUTOYO CORP | 3 | 2013 |
| YAMADA KEIJIself | 3 | 2013 |
| FUJITSU VLSI LTD | 2 | 1995–1997 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 5 | 1999–2004 |
| Kawasaki, JP | 3 | 1997–2009 |
| Osaka, JP | 3 | 1999–2000 |
| Toyohashi, JP | 2 | 2019 |
| Kure, JP | 2 | 2013 |