Inventor
Atsushi Ootake
Inventor
Saitama, JP
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Fprimary
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds18%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
Y10TTechnical subjects covered by former us classification10%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation8%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution8%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
H01JElectric discharge tubes or discharge lamps6%
H01LSemiconductor devices6%
B82YSpecific uses or applications of nanostructures2%
C07DHeterocyclic compounds2%
PatentTitleYear
9,938,405Hybridized insulating resin material for high voltage equipment and high voltage equipment using the same20189,842,953'Solar battery rectangular conductor, method for fabricating same and solar battery lead wire'20179,530,918'Solar battery rectangular conductor, method for fabricating same and solar battery lead wire'20169,508,883'Rectangular conductor for solar battery, method for fabricating same and lead wire for solar battery'20169,105,397'Capacitor embedded between busbars, electric power device and electric power conversion device'20158,748,734'Rectangular conductor for solar battery, method for fabricating same and lead wire for solar battery'20148,614,283'Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer'20138,580,481'Resist polymer and resist composition'20138,241,829'Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer'20128,114,949'(Meth)acrylate, polymer and resist composition'20128,092,979'Resist polymer and resist composition'20128,088,875'(Meth)acrylate, polymer and resist composition'20128,049,042'Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer'20117,575,846'Resist polymer and resist composition'20097,332,713'Mass spectrometric method and mass spectrometric system'20087,316,884'5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process'20086,917,037'Mass spectrum analyzing system'20056,793,768'Plasma-assisted processing apparatus'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2018Patents assigned to HITACHI LTD (4)· patent assignee history
2004–2017Based in Hitachi, JP· patent location history
2005–2015Based in Hitachiota, JP· patent location history
2008–2013Patents assigned to MITSUBISHI RAYON CO (9)· patent assignee history
2008–2013Based in Kanagawa, JP· patent location history
2011–2013Based in Saitama, JP· patent location history
2012–2015Patents assigned to OOTAKE ATSUSHI (8)· patent assignee history
2012–2013Patents assigned to MOMOSE HIKARU (4)· patent assignee history
2014–2017Patents assigned to HITACHI METALS LTD (4)· patent assignee history
2016–2018Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI RAYON CO | 9 | 2008–2013 |
| OOTAKE ATSUSHIself | 8 | 2012–2015 |
| HITACHI LTD | 4 | 2004–2018 |
| HITACHI METALS LTD | 4 | 2014–2017 |
| MOMOSE HIKARU | 4 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Saitama, JP | 5 | 2011–2013 |
| Hitachi, JP | 4 | 2004–2017 |
| Kanagawa, JP | 4 | 2008–2013 |
| Hitachiota, JP | 3 | 2005–2015 |
| Tokyo, JP | 2 | 2016–2018 |