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Inventor

Masahiko Saikawa

Inventor
Nagaokakyo, JP

Overview

10→
Patents
1985–2005
Patent span
Physics
Primary field (CPC G)

Patents· 10 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices56%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests28%
G03CPhotosensitive materials for photographic purposes11%
B41NPrinting plates or foils6%
PatentTitleYear
6,869,743'Method of processing light-sensitive material'20055,834,156'Method for processing photosensitive material and apparatus therefor'19985,427,889'Lithographic printing plate with pitted aluminum support'19955,398,092'Method and apparatus for developing lithographic offset printing plate'19954,873,170'Method for making lithographic printing plate'19894,824,760'Lithographic printing plate with benzotriazoles improved in printing endurance'19894,784,933'Method for making lithographic printing plate using light wavelengths over 700 .mu.m'19884,770,961'Light sensitive materials for lithographic printing plates'19884,621,041'Lithographic printing plate'19864,501,811'Process for making lithographic printing plates'1985

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1985–2005Patents assigned to MITSUBISHI PAPER MILLS LTD (9)· patent assignee history
1985–1989Based in Nagaokakyo, JP· patent location history
1986Based in Nagoya, JP· patent location history
1995–2005Based in Tokyo, JP· patent location history
1998Patents assigned to MITSUBISHI PAPERS MILLS LIMITE (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI PAPER MILLS LTD91985–2005
MITSUBISHI PAPERS MILLS LIMITE11998
Locations
LocationPatentsSpan
Nagaokakyo, JP51985–1989
Tokyo, JP41995–2005
Nagoya, JP11986