Inventor
Yan Ye
Inventor
San Diego, CA, US
Overview
Patents· 250 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H04Nprimary
H04NPictorial communication, e.g. television33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
H01JElectric discharge tubes or discharge lamps15%
H10DInorganic electric semiconductor devices6%
C23CCoating metallic material5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
H01LSemiconductor devices2%
C23FNon-mechanical removal of metallic material from surface2%
Y10TTechnical subjects covered by former us classification2%
PatentTitleYear
11,134,259System and method for enhanced motion compensation using adaptive filtering202111,109,044Color space conversion202110,909,614Systems and techniques for ranking items202110,855,992On block level bi-prediction with weighted averaging202010,841,566Methods and apparatus of viewport adaptive 360 degree video delivery202010,841,615Systems and methods for model parameter optimization in three dimensional based color mapping202010,798,423Cross-plane filtering for chroma signal enhancement in video coding202010,771,780Method and apparatus for signaling and construction of video coding reference picture lists202010,750,172Prediction systems and methods for video coding based on filtering nearest neighboring pixels202010,735,764Palette coding for screen content coding202010,708,605Inter-layer reference picture enhancement for multiple layer video coding202010,694,204Systems and methods for motion compensated residual prediction202010,666,953Sampling grid information for spatial layers in multi-layer video coding202010,652,588Inverse reshaping for high dynamic range video coding202010,629,581Thin film semiconductor material produced through reactive sputtering of zinc target using nitrogen gases202010,616,597Reference picture set mapping for standard scalable video coding202010,609,395High dynamic range video coding architectures with multiple operating modes202010,602,162Speedup techniques for rate distortion optimized quantization202010,587,897Specifying visual dynamic range coding operations and parameters202010,582,227Scalable coding based video distribution202010,547,853High level syntax for HEVC extensions202010,536,707Power aware video decoding and streaming202010,523,957Optimization using multi-threaded parallel processing framework201910,516,882Intra-block copy searching201910,484,717Codec architecture for multiple layer video coding201910,484,686Palette coding modes and palette flipping201910,469,904Power aware adaptation for video streaming201910,469,847Inter-component de-correlation for video coding201910,462,439Color correction with a lookup table201910,452,743Video and data processing using even-odd integer transforms201910,440,340Providing 3D look-up table (LUT) estimation for color gamut scalability201910,440,388Rate-distortion defined interpolation for video coding based on fixed filter or adaptive filter201910,429,567Multi-view pixel directional backlight module and naked-eye 3D display device201910,404,988Method and apparatus for the signaling of lossless video coding201910,405,000One-dimensional transform modes and coefficient scan order201910,397,616Cross-plane filtering for chroma signal enhancement in video coding201910,390,029Systems and methods for providing 3D look-up table coding for color gamut scalability201910,321,130Enhanced deblocking filters for video coding201910,306,240Intra block copy mode for screen content coding201910,284,874Methods and systems for intra block copy coding with block vector derivation201910,277,910Escape color coding for palette coding mode201910,277,909Single loop decoding based interlayer prediction201910,237,575Palette coding for screen content coding201910,237,555System and method of video coding quantization and dynamic range control201910,225,581Video coding with large macroblocks201910,218,971Adaptive upsampling for multi-layer video coding201910,154,258Power aware video decoding and streaming201810,154,269Methods, apparatus and systems for scalable video coding with mixed interlace and progressive content201810,154,286Systems and methods for model parameter optimization in three dimensional based color mapping201810,148,971Inter-layer prediction for scalable video coding201810,136,162Specifying visual dynamic range coding operations and parameters201810,110,910Parallel decoding method for layered video coding201810,104,374Inter-layer parameter set for HEVC extensions201810,063,921Power aware adaptation for video streaming201810,063,886Combined scalability processing for multi-layer video coding201810,057,570Method and apparatus for region of interest video coding using tiles and tile groups201810,054,859Real-time variable parameter micro-nano optical field modulation system and interference lithography system201810,057,594Enhanced temporal motion vector prediction for scalable video coding201810,055,189Two-dimensional palette coding for screen content coding20189,998,764Codec architecture for multiple layer video coding20189,973,751Slice base skip mode signaling for multiple layer video coding20189,967,590Rate-distortion defined interpolation for video coding based on fixed filter or adaptive filter20189,955,174Systems and methods for providing 3D look-up table coding for color gamut scalability20189,936,215Reference picture set mapping for standard scalable video coding20189,930,365'Video coding with large macroblocks'20189,924,166'Sampling grid information for spatial layers in multi-layer video coding'20189,912,925'Providing 3D look-up table (LUT) estimation for color gamut scalability'20189,900,593'Method and apparatus of motion vector prediction for scalable video coding'20189,885,814'Method for making color image and color filter manufactured with the method'20189,877,043Methods and systems for intra block copy coding with block vector derivation20189,871,124'Method of IGZO and ZnO TFT fabrication with PECVD SiO2 passivation'20189,819,947'Methods, apparatus and systems for scalable video coding with mixed interlace and progressive content'20179,788,015'Video coding with large macroblocks'20179,756,353'Hybrid reference picture reconstruction method for single and multiple layered video coding systems'20179,749,633'System and method of video coding quantization and dynamic range control'20179,729,888'Speedup techniques for rate distortion optimized quantization'20179,699,452'Systems and methods for spatial prediction'20179,648,333'High level syntax for HEVC extensions'20179,624,597'Methods and apparatuses for delaminating process pieces'20179,609,357'Non-zero rounding and prediction mode selection techniques in video encoding'20179,578,331'Separable directional transforms'20179,554,133'Method and apparatus for region of interest video coding using tiles and tile groups'20179,553,195'Method of IGZO and ZNO TFT fabrication with PECVD SiO2 passivation'20179,549,194'Context based inverse mapping method for layered codec'20179,467,695'Method and apparatus for signaling and construction of video coding reference picture lists'20169,438,898'Reference picture lists modification'20169,396,940'Thin film semiconductors made through low temperature process'20169,386,316'Adaptive coding of video block header information'20169,385,239'Buffer layers for metal oxide semiconductors for TFT'20169,372,287'Colored, dynamic, and amplified safety film'20169,369,712'Buffered adaptive filters'20169,282,343'Multiview and bitdepth scalable video delivery'20169,241,160'Reference processing using advanced motion models for video coding'20169,161,057'Non-zero rounding and prediction mode selection techniques in video encoding'20159,143,803'Filter prediction based on activity metrics in video coding'20159,113,169'Video encoding with temporally constrained spatial dependency for localized decoding'20159,100,660'Guided image up-sampling in video coding'20159,078,007'Digital video coding with interpolation filters and offsets'20159,077,971'Interpolation-like filtering of integer-pixel positions in video coding'20159,078,008'Adaptive inter-layer interpolation filters for multi-layered video delivery'20159,014,280'Video coding with adaptive filtering for motion compensated prediction'20159,008,171'Two pass quantization for CABAC coders'20158,980,066'Thin film metal oxynitride semiconductors'20158,975,625'TFT with insert in passivation layer or etch stop layer'2015D0723858'Coffee machine'20158,971,412'Advanced interpolation techniques for motion compensation in video coding'20158,948,258'Video coding with large macroblocks'20158,938,009'Layered encoded bitstream structure'20158,902,972'Rate-distortion quantization for context-adaptive variable length coding (CAVLC)'20148,891,615'Quantization based on rate-distortion modeling for CABAC coders'20148,848,787'Enhancement layer coding for scalable video coding'20148,840,763'Methods for stable process in a reactive sputtering process using zinc or doped zinc target'20148,831,086'Prediction techniques for interpolation in video coding'20148,817,879'Temporal error concealment for video communications'20148,811,484'Video encoding by filter selection'20148,809,132'Capping layers for metal oxynitride TFTs'20148,804,831'Offsets at sub-pixel resolution'20148,750,378'Offset calculation in switched interpolation filters'20148,724,707'Video decoding using temporally constrained spatial dependency'20148,711,930'Non-zero rounding and prediction mode selection techniques in video encoding'20148,705,622'Interpolation filter support for sub-pixel resolution in video coding'20148,681,867'Selective deblock filtering techniques for video coding based on motion compensation resulting in a coded block pattern value'20148,669,552'Offset electrode TFT structure'20148,638,852'Video coding of filter coefficients based on horizontal and vertical symmetry'20148,634,456'Video coding with large macroblocks'20148,619,853'Separable directional transforms'20138,619,856'Video coding with large macroblocks'20138,614,007'Thin film semiconductor material produced through reactive sputtering of zinc target using nitrogen gases'20138,611,435'Combined scheme for interpolation filtering, in-loop filtering and post-loop filtering in video coding'20138,574,411'Reactive sputtering chamber with gas distribution tubes'20138,571,104'Adaptive coefficient scanning in video coding'20138,542,730'Fast macroblock delta QP decision'20138,520,732'Adaptive coding of video block prediction mode'20138,503,527'Video coding with large macroblocks'20138,488,668'Adaptive coefficient scanning for video coding'20138,483,285'Video coding using transforms bigger than 4×4 and 8×8'20138,483,282'Entropy coding of interleaved sub-blocks of a video block'20138,462,842'Symmetry for interpolation filtering of sub-pixel positions in video coding'20138,435,843'Treatment of gate dielectric for making high performance metal oxide and metal oxynitride thin film transistors'20138,432,968'Scalable video coding techniques for scalable bitdepths'20138,428,133'Adaptive coding of video block prediction mode'20138,398,826'Thin film semiconductor material produced through reactive sputtering of zinc target using nitrogen gases'20138,401,082'Methods and systems for refinement coefficient coding in video compression'20138,349,669'Thin film transistors using multiple active channel layers'20138,315,308'Video coding with fine granularity spatial scalability'20128,298,879'Methods of fabricating metal oxide or metal oxynitride TFTS using wet process for source-drain metal etch'20128,294,148'Thin film transistors using thin film semiconductor materials'20128,279,577'Substrate support having fluid channel'20128,275,045'Video compression using adaptive variable length codes'20128,258,511'Thin film transistors using multiple active channel layers'20128,236,105'Apparatus for controlling gas flow in a semiconductor substrate processing chamber'20128,233,544'Video coding with fine granularity scalability using cycle-aligned fragments'20128,199,812'Adaptive upsampling for scalable video coding'20128,143,093'Process to make metal oxide thin film transistor array with etch stopping layer'20128,121,418'Methods and systems for significance coefficient coding in video compression'20128,101,949'Treatment of gate dielectric for making high performance metal oxide and metal oxynitride thin film transistors'20128,012,794'Capping layers for metal oxynitride TFTS'20117,994,508'Thin film transistors using thin film semiconductor materials'20117,988,470'Methods of fabricating metal oxide or metal oxynitride TFTs using wet process for source-drain metal etch'20117,972,467'Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor'20117,955,986'Capacitively coupled plasma reactor with magnetic plasma control'20117,927,713'Thin film semiconductor material produced through reactive sputtering of zinc target using nitrogen gases'20117,879,698'Integrated process system and process sequence for production of thin film transistor arrays using doped or compounded metal oxide semiconductor'20117,778,472'Methods and systems for significance coefficient coding in video compression'20107,768,765'Substrate support having heat transfer system'20107,754,997'Apparatus and method to confine plasma and reduce flow resistance in a plasma'20107,674,353'Apparatus to confine plasma and to enhance flow conductance'20107,674,662'Process for making thin film field effect transistors using zinc oxide'20107,618,516'Method and apparatus to confine plasma and to enhance flow conductance'20097,601,558'Transparent zinc oxide electrode having a graded oxygen content'20097,588,668'Thermally conductive dielectric bonding of sputtering targets using diamond powder filler or thermally conductive ceramic fillers'20097,585,384'Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor'20097,435,685'Method of forming a low-K dual damascene interconnect structure'20087,413,990'Method of fabricating a dual damascene interconnect structure'20087,309,448'Selective etch process of a sacrificial light absorbing material (SLAM) over a dielectric material'20077,300,597'Selective etch process of a sacrificial light absorbing material (SLAM) over a dielectric material'20077,256,134'Selective etching of carbon-doped low-k dielectrics'20077,220,937'Plasma reactor with overhead RF source power electrode with low loss, low arcing tendency and low contamination'20077,221,553'Substrate support having heat transfer system'20077,186,943'MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression'20077,132,369'Method of forming a low-K dual damascene interconnect structure'20067,132,618'MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression'20067,115,517'Method of fabricating a dual damascene interconnect structure'20067,094,316'Externally excited torroidal plasma source'20067,030,335'Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression'20066,939,808'Undoped and fluorinated amorphous carbon film as pattern mask for metal etch'20056,939,434'Externally excited torroidal plasma source with magnetic control of ion distribution'20056,921,727'Method for modifying dielectric characteristics of dielectric layers'20056,905,968'Process for selectively etching dielectric layers'20056,897,154'Selective etching of low-k dielectrics'20056,894,245'Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression'20056,853,141'Capacitively coupled plasma reactor with magnetic plasma control'20056,677,712'Gas distribution plate electrode for a plasma receptor'20046,667,577'Plasma reactor with spoke antenna having a VHF mode with the spokes in phase'20036,652,712'Inductive antenna for a plasma reactor producing reduced fluorine dissociation'20036,623,595'Wavy and roughened dome in plasma processing reactor'20036,620,289'Method and apparatus for asymmetric gas distribution in a semiconductor wafer processing system'20036,607,634'Reticle adapter for a reactive ion etch system'20036,607,675'Method of etching carbon-containing silicon oxide films'20036,586,886'Gas distribution plate electrode for a plasma reactor'20036,551,446'Externally excited torroidal plasma source with a gas distribution plate'20036,547,977'Method for etching low k dielectrics'20036,547,978'Method of heating a semiconductor substrate'20036,534,416'Control of patterned etching in semiconductor features'20036,494,986'Externally excited multiple torroidal plasma source'20026,488,862'Etched patterned copper features free from etch process residue'20026,489,247'Copper etch using HCl and HBR chemistry'20026,468,388'Reactor chamber for an externally excited torroidal plasma source with a gas distribution plate'20026,458,516'Method of etching dielectric layers using a removable hardmask'20026,455,431'NH3 plasma descumming and resist stripping in semiconductor applications'20026,453,842'Externally excited torroidal plasma source using a gas distribution plate'20026,410,449'Method of processing a workpiece using an externally excited torroidal plasma source'20026,372,633'Method and apparatus for forming metal interconnects'20026,352,081'Method of cleaning a semiconductor device processing chamber after a copper etch process'20026,352,049'Plasma assisted processing chamber with separate control of species density'20026,348,126'Externally excited torroidal plasma source'20026,331,380'Method of pattern etching a low K dielectric layer'20016,312,554'Apparatus and method for controlling the ratio of reactive to non-reactive ions in a semiconductor wafer processing chamber'20016,296,780'System and method for etching organic anti-reflective coating from a substrate'20016,277,251'Apparatus and method for shielding a dielectric member to allow for stable power transmission into a plasma processing chamber'20016,270,687'RF plasma method'20016,251,217'Reticle adapter for a reactive ion etch system'20016,178,920'Plasma reactor with internal inductive antenna capable of generating helicon wave'20016,158,384'Plasma reactor with multiple small internal inductive antennas'20006,153,530'Post-etch treatment of plasma-etched feature surfaces to prevent corrosion'20006,143,476'Method for high temperature etching of patterned layers using an organic mask stack'20006,080,529'Method of etching patterned layers useful as masking during subsequent etching or for damascene structures'20006,071,372'RF plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls'20006,020,686'Inductively and multi-capacitively coupled plasma reactor'20006,010,603'Patterned copper etch for micron and submicron features, using enhanced physical bombardment'20006,008,140'Copper etch using HCI and HBr chemistry'19995,968,847'Process for copper etch back'19995,900,062'Lift pin for dechucking substrates'19995,891,348'Process gas focusing apparatus and method'19995,879,575'Self-cleaning plasma processing reactor'19995,817,534'RF plasma reactor with cleaning electrode for cleaning during processing of semiconductor wafers'19985,801,386'Apparatus for measuring plasma characteristics within a semiconductor wafer processing system and a method of fabricating and using same'19985,756,400'Method and apparatus for cleaning by-products from plasma chamber surfaces'19985,753,137'Dry cleaning of semiconductor processing chambers using non-metallic, carbon-comprising material'19985,710,486'Inductively and multi-capacitively coupled plasma reactor'19985,685,916'Dry cleaning of semiconductor processing chambers'19975,676,759'Plasma dry cleaning of semiconductor processing chambers'19975,628,870'Method for marking a substrate using ionized gas'19975,622,565'Reduction of contaminant buildup in semiconductor apparatus'19975,608,155'Method and apparatus for detecting particles on a substrate'19975,578,131'Reduction of contaminant buildup in semiconductor processing apparatus'19965,486,235'Plasma dry cleaning of semiconductor processing chambers'19965,474,640'Apparatus for marking a substrate using ionized gas'19955,456,796'Control of particle generation within a reaction chamber'19955,423,918'Method for reducing particulate contamination during plasma processing of semiconductor devices'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995–2020Patents assigned to APPLIED MATERIALS INC (113)· patent assignee history
1995–2006Based in Campbell, CA, US· patent location history
1997Based in Cupertino, CA, US· patent location history
2000–2020Based in Saratoga, CA, US· patent location history
2010–2019Patents assigned to QUALCOMM INC (49)· patent assignee history
2010–2021Based in San Diego, CA, US· patent location history
2012–2018Patents assigned to YE YAN (71)· patent assignee history
2013–2018Patents assigned to KARCZEWICZ MARTA (33)· patent assignee history
2016–2020Patents assigned to VID SCALE INC (59)· patent assignee history
2018–2019Based in Jiangsu, CN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 113 | 1995–2020 |
| YE YANself | 71 | 2012–2018 |
| VID SCALE INC | 59 | 2016–2020 |
| QUALCOMM INC | 49 | 2010–2019 |
| KARCZEWICZ MARTA | 33 | 2013–2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Diego, California, US | 126 | 2010–2021 |
| Saratoga, California, US | 71 | 2000–2020 |
| Campbell, California, US | 40 | 1995–2006 |
| Jiangsu, CN | 3 | 2018–2019 |
| Cupertino, California, US | 2 | 1997 |