Inventor
Martinus Cornelis Maria Verhagen
Inventor
Valkenswaard, NL
Overview
Patents· 46 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices51%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
B01DSeparation10%
C02FTreatment of water, waste water, sewage, or sludge6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
G21KHandling of particles or ionising radiation not otherwise provided for2%
F28DHeat-exchange apparatus, not provided for in another subclass, in which the heat-exchange media do not come into direct contact1%
G01KMeasuring temperature1%
G06FElectric digital data processing1%
H05GX-ray technique1%
PatentTitleYear
10,838,310Lithographic apparatus and device manufacturing method involving a heater202010,705,439Lithographic apparatus and device manufacturing method202010,599,054Lithographic apparatus and device manufacturing method202010,331,047Lithographic apparatus and device manufacturing method201910,254,663Lithographic apparatus and device manufacturing method involving a heater201910,248,033Lithographic apparatus and device manufacturing method20199,904,185'Lithographic apparatus and device manufacturing method'20189,753,380'Lithographic apparatus and device manufacturing method'20179,746,788'Lithographic apparatus and device manufacturing method'20179,581,914'Lithographic apparatus and device manufacturing method'20179,507,278'Lithographic apparatus and device manufacturing method'20169,488,923'Lithographic apparatus and device manufacturing method'20169,436,097'Lithographic apparatus and device manufacturing method'20169,411,238'Source-collector device, lithographic apparatus, and device manufacturing method'20169,268,242'Lithographic apparatus and device manufacturing method involving a heater and a temperature sensor'20169,268,236'Lithographic apparatus and device manufacturing method having heat pipe with fluid to cool substrate and/or substrate holder'20169,188,880'Lithographic apparatus and device manufacturing method involving a heater'20159,025,127'Lithographic apparatus and device manufacturing method'20158,958,051'Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid'20158,953,144'Lithographic apparatus and device manufacturing method'20158,934,082'Lithographic apparatus and device manufacturing method'20158,902,404'Lithographic apparatus and device manufacturing method'20148,755,028'Lithographic apparatus and device manufacturing method'20148,629,971'Lithographic apparatus and device manufacturing method'20148,610,089'Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning method'20138,508,711'Lithographic apparatus and device manufacturing method'20138,446,563'Lithographic apparatus and device manufacturing method'20138,246,838'Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method'20128,107,053'Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid'20128,045,137'Lithographic apparatus and device manufacturing method'20118,031,325'Lithographic apparatus and device manufacturing method'20118,018,573'Lithographic apparatus and device manufacturing method'20118,004,652'Lithographic apparatus and device manufacturing method'20117,914,687'Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method'20117,804,575'Lithographic apparatus and device manufacturing method having liquid evaporation control'20107,751,027'Lithographic apparatus and device manufacturing method'20107,733,459'Lithographic apparatus and device manufacturing method'20107,701,550'Lithographic apparatus and device manufacturing method'20107,602,470'Lithographic apparatus and device manufacturing method'20097,428,038'Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid'20087,397,533'Lithographic apparatus and device manufacturing method'20087,378,025'Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method'20087,378,669'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20087,379,155'Lithographic apparatus and device manufacturing method'20087,271,873'Lithographic apparatus and device manufacturing method'20077,072,021'Lithographic apparatus and device manufacturing method'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2020Patents assigned to ASML NETHERLANDS BV (46)· patent assignee history
2006–2020Based in Valkenswaard, NL· patent location history
2009–2020Patents assigned to ASML HOLDING NV (12)· patent assignee history
2012–2016Patents assigned to VERHAGEN MARTINUS CORNELIS MARIA (15)· patent assignee history
2012–2016Patents assigned to JACOBS JOHANNES HENRICUS WILHELMUS (10)· patent assignee history
2013–2016Patents assigned to MERTENS JEROEN JOHANNES SOPHIA MARIA (8)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 46 | 2006–2020 |
| VERHAGEN MARTINUS CORNELIS MARIAself | 15 | 2012–2016 |
| ASML HOLDING NV | 12 | 2009–2020 |
| JACOBS JOHANNES HENRICUS WILHELMUS | 10 | 2012–2016 |
| MERTENS JEROEN JOHANNES SOPHIA MARIA | 8 | 2013–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Valkenswaard, NL | 46 | 2006–2020 |