Inventor
Markus Mengel
Inventor
Heidenheim, DE
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
G01MTesting static or dynamic balance of machines or structures21%
Y10TTechnical subjects covered by former us classification13%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light10%
G02BOptical elements, systems or apparatus10%
C03CChemical composition of glasses, glazes or vitreous enamels3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
PatentTitleYear
9,798,249'Method and apparatus for compensating at least one defect of an optical system'20179,429,495'System for measuring the image quality of an optical imaging system'20169,274,440'Arrangement for and method of characterising the polarization properties of an optical system'20169,034,539'Controllable transmission and phase compensation of transparent material'20158,823,948'System for measuring the image quality of an optical imaging system'20148,735,030'Method and apparatus for modifying a substrate surface of a photolithographic mask'20148,675,178'Microlithographic projection exposure apparatus'20148,488,127'System for measuring the image quality of an optical imaging system'20137,924,436'Method for approximating an influence of an optical system on the state of polarization of optical radiation'20117,796,274'System for measuring the image quality of an optical imaging system'20107,760,366'System for measuring the image quality of an optical imaging system'20107,456,933'Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatus'20087,289,223'Method and apparatus for spatially resolved polarimetry'20077,286,245'Method and apparatus for determining the influencing of the state of polarization by an optical system; and an analyser'20077,277,182'Apparatus for polarization-specific examination, optical imaging system, and calibration method'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2010Patents assigned to ZEISS CARL SMT AG (6)· patent assignee history
2007–2017Based in Heidenheim, DE· patent location history
2011–2017Patents assigned to ZEISS CARL SMT GMBH (9)· patent assignee history
2013–2016Patents assigned to MENGEL MARKUS (5)· patent assignee history
2014–2017Patents assigned to ZEISS CARL SMS LTD (3)· patent assignee history
2014–2015Patents assigned to KLAESGES RALPH (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT GMBH | 9 | 2011–2017 |
| ZEISS CARL SMT AG | 6 | 2007–2010 |
| MENGEL MARKUSself | 5 | 2013–2016 |
| ZEISS CARL SMS LTD | 3 | 2014–2017 |
| KLAESGES RALPH | 2 | 2014–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Heidenheim, DE | 15 | 2007–2017 |