Inventor

Toshikazu Takayama

Inventor

Kawasaki, JP

Overview

2003–2019

Patent span

Physics

Primary field (CPC G)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests19%

C07CAcyclic or carbocyclic compounds8%

C09DCoating compositions, e.g. paints, varnishes or lacquers8%

B05DProcesses for applying fluent materials to surfaces, in general4%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds4%

C08LCompositions of macromolecular compounds4%

C09KMaterials for miscellaneous applications, not provided for elsewhere4%

H01LSemiconductor devices4%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2003–2019Patents assigned to TOKYO OHKA KOGYO CO LTD (11)· patent assignee history

2003–2013Based in Kanagawa, JP· patent location history

2009–2019Based in Kawasaki, JP· patent location history

2012–2013Patents assigned to TAKAYAMA TOSHIKAZU (4)· patent assignee history

2012–2013Patents assigned to ISHIDUKA KEITA (3)· patent assignee history

2012Patents assigned to HADA HIDEO (2)· patent assignee history

2012Patents assigned to YAMADA TOMOTAKA (2)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Locations

Location	Patents	Span
Kawasaki, JP	8	2009–2019
Kanagawa, JP	3	2003–2013