Inventor
CHIEN-HAO CHEN
Inventor
TW
Overview
Patents· 50 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices28%
H10DInorganic electric semiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
G06VImage or video recognition or understanding6%
G06FElectric digital data processing4%
H05KPrinted circuits4%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
H01JElectric discharge tubes or discharge lamps2%
H01RElectrically-conductive connections2%
PatentTitleYear
12,532,531Integrated circuit metal gate structure and method of fabricating thereof202612,497,982Magnetic computer case202512,462,548Neural network system and signal processing method202512,437,581Training system, training method and recognition system202512,438,128Semiconductor device package202512,431,356Metal gate structure and method of forming the same202512,422,904Graphics card lifting device202512,396,244Semiconductor structure202512,300,733Semiconductor device with a work function layer having an oxygen-blocking dopant layer202512,255,104Semiconductor device and method of manufacture202512,237,228Semiconductor device and method202512,183,590Method of performing gap filling including filling trenches between dummy gate stacks on semiconductor fins/strips with semiconductor material202412,183,629Selective hybrid capping layer for metal gates of transistors202412,185,490Supporting assemblies for installable components202412,174,675Holding devices for computing components202412,147,163Method for correcting critical dimension measurements of lithographic tool202412,142,530Semiconductor device and method of manufacture202412,131,488Electronic apparatus and method used for object tracking202412,125,306Method and apparatus for person re-identification202412,107,086Field effect transistor contact with reduced contact resistance202412,106,962Patterning method and overlay measurement method202412,087,767Method of tuning threshold voltages of transistors202412,040,235Semiconductor device and method of manufacture202412,033,897Method for forming semiconductor structure202411,922,710Character recognition method, character recognition device and non-transitory computer readable medium202411,916,146Gate resistance reduction through low-resistivity conductive layer202411,887,967Semiconductor device package and method of manufacturing the same202411,847,821Face recognition network model with face alignment based on knowledge distillation202311,756,834Semiconductor structure and method for forming the same202311,734,956Processing circuit and processing method applied to face recognition system202311,735,481Semiconductor device and method202311,715,639Semiconductor device and fabrication method therefor202311,651,985Alignment system and alignment mark202311,610,818Semiconductor structure and method for forming the same202311,605,543Method of gap filling using conformal deposition-annealing-etching cycle for reducing seam void and bending202311,569,365Semiconductor structure and method for manufacturing the same202311,538,805Method of tuning threshold voltages of transistors202211,532,509Selective hybrid capping layer for metal gates of transistors202211,495,006Object detection method for static scene and associated electronic device202211,497,131Electrical connectors with link members2022D0965828Luminous wire202211,444,173Semiconductor device structure with salicide layer and method for forming the same202211,437,280Semiconductor device and method of manufacture202211,387,344Method of manufacturing a semiconductor device having a doped work-function layer202211,302,818Gate resistance reduction through low-resistivity conductive layer202211,289,482Field effect transistor contact with reduced contact resistance202211,289,343Method of gap filling using conformal deposition-annealing-etching cycle for reducing seam void and bending202211,205,709Defect filling in patterned layer202111,183,426Method for forming a FinFET structure that prevents or reduces deformation of adjacent fins202111,139,274Semiconductor device package and method of manufacturing the same2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (30)· patent assignee history
2021–2025Patents assigned to ADVANCED SEMICONDUCTOR ENG (3)· patent assignee history
2021–2026Based in TW· patent location history
2022–2025Patents assigned to REALTEK SEMICONDUCTOR CORP (8)· patent assignee history
2022–2025Patents assigned to CHEN CHIEN HAO (3)· patent assignee history
2022–2024Patents assigned to HEWLETT PACKARD DEVELOPMENT CO (3)· patent assignee history
2022Based in CN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 30 | 2021–2026 |
| REALTEK SEMICONDUCTOR CORP | 8 | 2022–2025 |
| ADVANCED SEMICONDUCTOR ENG | 3 | 2021–2025 |
| CHEN CHIEN HAOself | 3 | 2022–2025 |
| HEWLETT PACKARD DEVELOPMENT CO | 3 | 2022–2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 49 | 2021–2026 |
| CN | 1 | 2022 |