Inventor

Shuichi Okuno

Inventor

Hyogo, JP

Overview

2000

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C02Fprimary

C02FTreatment of water, waste water, sewage, or sludge50%

C11DDetergent compositions50%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2000Patents assigned to NIPPON CATALYTIC CHEM IND (1)· patent assignee history

2000Patents assigned to TEIKOKU CHEMICAL IND CO LTD (1)· patent assignee history

2000Based in Hyogo, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
NIPPON CATALYTIC CHEM IND	1	2000
TEIKOKU CHEMICAL IND CO LTD	1	2000

Locations

Location	Patents	Span
Hyogo, JP	1	2000