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Inventor

Hsin-Chang Li

Inventor
Hsinchu, TW

Overview

1→
Patents
2004
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
6,830,853'Chrome mask dry etching process to reduce loading effect and defects'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004Patents assigned to TAIWAN SEMICONDUCTOR MFG (1)· patent assignee history
2004Based in Hsinchu, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG12004
Locations
LocationPatentsSpan
Hsinchu, TW12004